Used KOKUSAI DJ-1205V #9120659 for sale

KOKUSAI DJ-1205V
ID: 9120659
Wafer Size: 12"
Vertical diffusion furnace, 12".
KOKUSAI DJ-1205V is a diffusion furnace and accessory that is designed to provide high-performance thermal processing capabilities with superior temperature uniformity, repeatability, and control. DJ-1205V is equipped with a vertically mounted, high-powered, single-zone furnace that provides uniform temperatures up to 1150°C. The temperature of the furnace is monitored and controlled by a temperature controller which includes powerful PID tuning capabilities. The furnace is fitted with a molybdenum hearth plate that is designed to minimize temperature gradients. This plate is covered with a high-temperature quartz tube that is compatible with evaporative materials such as SiO2 and polyimide. There is also a built-in gas panel located in the rear of the chamber for connecting an inert gas source for processes requiring high purity or special atmosphere. KOKUSAI DJ-1205V also features a high-performance vacuum system with a single-stage mechanical pump. It is equipped with a set of four KF ports for connecting a wide variety of accessories including an exhaust trap, a temperature controller, and a vacuum gauge. In addition, it includes a water cooling system for helping to maintain the desired operating temperature. DJ-1205V is designed for simplicity and ease of use. It has a clear and easy-to-navigate user menu and the interface provides clear information on the status of the furnace, temperature, vacuum, and accessories. It also includes safety features such as a built-in over-temperature protection function and an emergency stop switch. Finally, a range of optional accessories including endo-thermal treatment, diffusion tube, reactional gas injection, and sample tray are available. KOKUSAI DJ-1205V is an ideal diffusion furnace and accessory for laboratory and industrial applications that require a reliable and efficient thermal processing solution. It provides users with precise control and repeatable results as well as a high degree of temperature uniformity, making it a great choice for many thermal processing applications.
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