Used KOKUSAI DJ-1223VN-DF #293753955 for sale

KOKUSAI DJ-1223VN-DF diffusion furnace is an indispensable tool for handling a variety of wafer related processes such as diffusion, oxidation, annealing and RTP. With a heating capability of up to 1223C and a 300mm x 300mm heating zone, this piece of equipment is efficient at large pad wafer heating and also suitable for small wafer applications such as die bonders. The furnace has high accuracy power and temperature control systems. It utilizes rapid thermal processing (RTP) with an automatic temperature control system to ensure uniform heating throughout all processing areas of the chamber. This accuracy is matched by its precision gas flow control, which is used to provide even gas concentration throughout the chamber. Additionally, there is an insulated internal chamber and quartz window which makes the furnace energy efficient and prevents emissive loss. Additional accessories include a quartz tube, gas supply system and a PC control module. The quartz tube reduces the radiant heat component of the furnace to ensure temperature uniformity inside the chamber. The gas supply system provides delivery of various purity gases to perform successful processes at DJ-1223VN-DF with improved repeatability. Lastly, the PC control module includes a software package to drive, monitor, and control the various processes that take place within the furnace. KOKUSAI DJ-1223VN-DF gives maximum performance and reliability in all wafer process applications. It has an intuitive user interface, is highly accurate in its temperature and power control, and ensures uniform heating throughout the chamber. The additional accessories further increase its capabilities by guaranteeing precise gas flow control and providing energy efficiency. Altogether, DJ-1223VN-DF is a successful and reliable wafer diffusion furnace.