Used KOKUSAI DJ-815V-8L #293623306 for sale

ID: 293623306
Wafer Size: 8"
Vintage: 1995
LPCVD Silicon nitride reactor, 8" Si3N4 Load-locked CX 2003A Controller High throughput Cassette-to-cassette vertical reactor Doped Polysi and Silicon Nitride 1995 vintage.
KOKUSAI DJ-815V-8L is a diffusion furnace and accessories designed for efficient processing of semiconductor devices. The equipment offers a range of benefits, including increased flexibility, improved performance, and energy savings. The furnace is designed with a simple vertical chamber equipped with a backside cooling system. The design allows for quick temperature changes and efficient heat distribution, resulting in shorter processing times. The use of vacuum-assisted mechanized sample loading reduces cycle times and increases process yield. The unit's control machine provides flexibility with user-definable recipes, data logging, and an intuitive graphical user interface. KOKUSAI DJ 815V-8L also features automated heating and cooling functions. This enables a more consistent thermal profile and maximizes cycle time by maintaining a stable temperature within the process chamber. The tool is highly accurate and stable with a temperature controller that can achieve a precision of ±0.3°C. The vertical design of the chamber also ensures uniform heat distribution, eliminating the need for sample rotation. The asset is also equipped with a process gas injection design. The process gas injection enables multiple steps of processing to occur simultaneously, reducing cycle time and increasing efficiency. This is especially beneficial for processes requiring multiple stages such as alloying, oxide deposition, and etching. DJ-815-V-8L is designed to reduce downtime and provide a lower cost of ownership. The model is designed for ease of service, allowing for fast and easy maintenance. The furnace is also equipped with a diagnostics monitoring equipment that quickly detects faults and simplifies maintenance tasks. In conclusion, DJ-815V-8L is a well-designed diffusion furnace and accessories system. It is a flexible, efficient, and cost-effective solution for high-volume semiconductor processing. The combination of increased flexibility, improved performance, and energy savings make the unit an attractive option for industry needs.
There are no reviews yet