Used KOKUSAI / HIKE DD-803V #293643498 for sale

KOKUSAI / HIKE DD-803V is a diffusion furnace and accessory set used to engineer a variety of semiconductor devices and materials. It is composed of a self-contained vertical chamber with an integrated digital controller and reliable gas control system. HIKE DD-803V provides a consistent, high-temperature thermal environment with a premium spatial uniformity, making it an ideal candidate for mass production processes. KOKUSAI DD-803V operates under a wide range of temperatures from 100 to 1200 degrees Celsius. It has a recessed zone main door allowing for safe and easy access to the heated chamber, and a quartz lid, which provides efficient heat transfer for uniform temperature and pressure distribution throughout the process chamber. The quartz lid also allows for a wider variety of optional accessories such as gas or gas/light-wave windows for monitoring or pyrometer heat control. DD-803V also comes with both convection and radiant heating elements to accommodate different processes. The thermal uniformity of KOKUSAI / HIKE DD-803V is achieved through two independent controllers and two sets of precision temperature sensors. The furnace also has an integral low-thermal radiation area, ensuring an even spatial distribution of temperature. The controlled temperature environment is maintained through a multi-zone, digital PID control console. Its advanced operating system allows for user-friendly temperature and gas control, independent program loading, data logging and Ethernet interface. HIKE DD-803V is highly versatile and ideal for applying diffusion, oxidation and annealing processes. It is equipped with a built-in mass flow controller (MFC) which enables precise control of a variety of inert, reducing and reactive gases such as oxidizers, nitrogen, argon and hydrogen. Manifolds with switchable connections make it possible to use up to four gases simultaneously, controlled in discrete steps by pressure or flow rate. KOKUSAI DD-803V provides reliable, user-friendly technology at an affordable price for a variety of applications, including deposition, processing and metallurgical laboratory experimentation. It is designed to provide an optimal and precise chemical vapor deposition (CVD) environment for coating, heat treating and diffusion operations. The highly efficient diffusion heating system makes it ideal for use in semiconductor device fabrication, chemical vapor and epitaxial deposition.