Used KOKUSAI Quixace II ALD Oxide #293600574 for sale

KOKUSAI Quixace II ALD Oxide is an advanced diffusion furnace and accessories equipment for rapid thermal processing of materials for applications in the semiconductor industry. The system is based on a single-wafer aluminum oxide (Al2O3) reactor, enabling low-temperature oxidation and annealing of wafer materials. It is equipped with an automated atmosphere control module and a high-temperature pre-evaporation chamber, providing a highly reliable in situ process control over the entire operation. The advanced Quixace II ALD Oxide diffusion furnace features a precision temperature control unit, enabling accurate and stable thermal process operations through a wide temperature range. The temperature can be set with a high level of accuracy, giving highly reproducible thermal processes. The machine is designed to handle up to 100 mm or 200 mm wafers, making it ideal for high-volume applications. KOKUSAI Quixace II ALD Oxide also features a low-flow, low-leak vacuum tool, allowing higher productivity than conventional diffusion furnaces. The asset is equipped with an array of sensors, energy sources and substrate holders, providing flexibility for a range of applications. In addition, the model is equipped with an advanced Layer Scanner that monitors the thickness and crystalline structure of the layer being processed. Quixace II ALD Oxide also includes a vacuum manifold, allowing lower power consumption and improved process repeatability. This equipment also offers a number of safety features, such as temperature sensors, interlocks and emergency shutoff. KOKUSAI Quixace II ALD Oxide is a robust and efficient platform for thermal processing of materials, offering a high level of process repeatability, reliability and safety. The system's advanced features enable users to achieve high process throughput and optimization, resulting in an improved yield.