Used KOKUSAI Quixace II Anneal #293818330 for sale

KOKUSAI Quixace II Anneal is the latest diffusion furnace and accessories equipment developed by KOKUSAI High-Tech Solutions. It is a precision device designed for high-end thermal processes such as annealing and diffusion. Quixace II Anneal includes two major components; an 8-zone heated furnace chamber and an optional liquid-cooled chill plate system. The 8-zone heater ensures precise control and uniform temperature distribution to create uniform results with consistent properties. The chill plate unit provides rapid cooling cycles which allow for precise process control. KOKUSAI Quixace II Anneal is ideal for a variety of thermal processes, such as annealing, diffusion, recrystallization, crystal growth, and other high-temperature applications. It utilizes RF heating and inductively coupled plasma (ICP) power sources, allowing it to operate at temperatures up to 2400 °C and has a rapid heating rate of 5 °C/sec. It utilizes a layered structure for efficient thermal processing and is capable of precise process control via five dedicated motion stages. This enables rapid and accurate control of temperature, pressure and atmosphere, and most importantly, quick and efficient process execution. The machine also includes an intuitive controller, allowing for ease of use. It is equipped with a user-friendly, Windows-based interface enabling remote control of the main processes. Multi-channel, voice-guided, and instruction-based menus make programming and operating procedures simple and stress-free. Quixace II Anneal is designed with safety and operator convenience in mind. It is equipped with a series of suspension cells, lid and interlock switches, emergency power cutoff, and anti-spark device to protect against overheating. The liquid-cooled chill plate tool efficiently stabilizes the chamber temperature, and also offers improved process performance. Additionally, the furnace has a heater-mounted dual-gauge control valve, enabling precise zonal temperature control over the whole range. KOKUSAI Quixace II Anneal is an advanced asset designed for precise and accurate thermal processing. It offers process control accuracy, high throughput, enhanced safety, uniform temperatures, low operating costs, and long device life expectancy. It is an ideal tool for thermal processes such as diffusion, annealing, crystallization, and crystal growth.