Used KOKUSAI Quixace II Anneal #293822421 for sale

KOKUSAI Quixace II Anneal is a diffusion furnace and accessories equipment used in the production of semiconductor devices. It is an innovating thermal processing system designed to meet the highest process performance requirements. The unit utilizes advanced technology to provide excellent annealing results, even in the most challenging processes. The machine features a vacuum deposition chamber and an annealing chamber. The vacuum deposition chamber is capable of vacuum levels up to 5 x 10-7 torr and is used for deposit of metallization layers. The tool's annealing chamber is used for the re-crystallization of the metallization layers and the device structures. It is equipped with infrared lamps that enable annealing at high temperatures in a controlled atmosphere. Quixace II Anneal is specifically designed to minimize thermal diffusion in aluminum and aluminum-lithium systems. It features a control asset with feedback loops, enabling precision temperature profile control with process time. The model also allows for the recycling of active and inert gasses which helps reduce waste. The annealing chamber is also equipped with a computerized process control equipment, allowing operators to monitor the process parameters and maintain the annealing temperature within a finely-tuned, repeatable range. Monitoring instruments appropriately distribute and balance heat and gaseous flows, enabling accurate, repeatable thermal processes with consistent process results and excellent product reliability. With its innovative technology, KOKUSAI Quixace II Annealing system is a powerful tool in semiconductor device production. It enables producers to quickly anneal metallization layers and device structures at high temperatures with consistent process results. The unit also helps producers reduce energy consumption, eliminate environmental hazards, and reduce waste. It is an ideal annealing machine choice for any semiconductor device production environment.