Used KOKUSAI Quixace II Doped Poly #9172063 for sale
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ID: 9172063
Wafer Size: 12"
Vintage: 2014
Vertical LPCVD furnaces, 12"
Software version: CX5000 (OU Ver.1.50.01)
Loader configuration:
(5) Loaders
System configuration:
Furnace unit:
(1) Cartridge heater
(5) T/C for heater control
(1) T/C for sub heater control
(5) T/Cs for over temperature protection
(1) 5-P T/C for cascade control
(1) 1-P T/C for profile control
(1) Thyristor unit for control
Clean unit:
(4) Clean module units
Controller:
Main controller (OU)
Main operation unit
Sub operation unit
Process module controller
(2) DDC Temperature controllers
(2) Gate drive units
MFC / Pressure unit
FOUP Loader controller unit
Wafer handling controller unit
Valve / Interlock control unit
Switching unit
Signal tower: Front
(2) Gas flow pattern panels
EDA Controller
EDA Operation unit
Drive mechanisms:
I/O Shutter
AGV / PGV / OHT Stage
FOUP Loader
Rotation FOUP storage
FOUP Opener
(2) Wafer detections
Wafer transfer
Variable wafer pitch converter
Boat elevator
Boat changer
Furnace port shutter
Boat rotation
Wafer transfer crash detector
Gas system:
Gas unit (IGS)
Exhaust system:
Dry pump
Mechanical booster pump
Diaphragm sensor: 1000 Torr
Diaphragm sensor: 2 Torr
Main valve
Exhaust piping
Exhaust dilution line
Reactor tube press leak line
Back ground line
Jacket heater for exhaust pipe
Seal cap heater
Inlet flange heater
Inlet port heater
Safety:
Light curtain system
Other:
(2) OHT I / F Unit
(1) Gateway-HSMS
(2) RF ID Readers
(2) Antennas
(2) Cantees
(2) Chemical filters
N2 Purge load lock system
O2 Monitor / Detector
FOUP Opener N2 purge system
Loading area MFC
Loading area N2 purge line
FOUP Opener N2 purge line
System power rating: 480 AC, 3 phase
Currently installed
2014 vintag
KOKUSAI Quixace II Doped Poly is a high-tech diffusion furnace and accessories equipment designed for consistent, reliable production of the latest semiconductor device technologies. The system includes a 400 mm Multi-Zone Tube furnace, Substrate Heater, Gas Box Preparation Station, Vacuum Treated Ammonia Leak Detector, and multiple Gas Boxes with delivery lines. The furnace is constructed of a thermal-resistant and corrosion-resistant stainless steel with a simple and efficient mechanical structure, making it an ideal choice for customers pursuing economy, quality, and efficiency. The Multi-Zone Tube furnace features an 8-zone thermal control unit with independent precise temperature control, uniform temperature distribution, and precise thermal cycle process control. The furnace tube is made from a double-layer quartz coating for excellent heat efficiency. The end of the tube is fitted with a special nozzle to prevent warping and damage to fragile components. The tube is also equipped with a quartz window for direct view of the interior of the tube with a built-in filter to prevent contamination from dust and other particles. The Substrate Heater is designed for use with Quixace II Doped Poly to heat substrates up to 2000°C. The unit is compact in size and requires minimal installation time. It comes with two independently controlled thermal stages and a high-performance fan for an even and consistent flow of air over the substrates for uniform heating. The Gas Box Preparation Station is constructed to meet the needs of the most exacting semiconductor fabrication environment. It is equipped with a nitrogen storage bottle, two independent gas lines, a handy CGA-connection port, and a simple control interface. The nitrogen bottle not only can be used to maintain the flow of nitrogen required for the substrate fabrication process, but also can serve as a fail-safe backup supply in the event of an unexpected power interruption. The Vacuum Treated Ammonia Leak Detector is an efficient and reliable ammeter machine that provides detection of hazardous ammonia vapors. With up to three independent channels and a built-in control and inflation tool, this detector allows you to easily detect and alarm potential ammonia release in an adjustable range up to 10 ppm. KOKUSAI Quixace II Doped Poly is the optimal solution for meeting the needs of advanced semiconductor production. With its state-of-the-art features and a robust design, this asset provides a reliable platform to ensure an efficient process throughput and the quality of manufactured products.
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