Used KOKUSAI Quixace II Nitride #293638694 for sale
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KOKUSAI Quixace II Nitride is a diffusion furnace and a complete range of accessories for high temperature heat treatment of metals. This state-of-the-art diffusion equipment is designed to enable uniform and even nitriding to be achieved through precise control of temperatures and atmospheres. Quixace II Nitride is suitable for both laboratory and industrial applications, and is easy to install and operate. The main features of KOKUSAI Quixace II Nitride include a cylindrical design with an in-situ ceramic shell insert. This insert ensures that the temperature is evenly distributed throughout the nitriding chamber, minimizing the risk of overheating and ensuring uniform nitride layer thickness. The furnace is capable of heating up to a maximum of 1250°C and is equipped with a equipment that allows easy temperature control and monitoring. This can be achieved using touchpad LCD displays and various sensors including oxygen, carbon dioxide and nitrogen dioxide. The product also includes a six-stage gas metering system, allowing precise control of the gas composition within the chamber. Suitable gases include nitrogen, hydrogen, ammonia and natural gas, which can be metered as needed by the user. The unit also allows for the automatic purging of the chamber prior to nitriding treatments, thus eliminating any impurities in the process. Furthermore, Quixace II Nitride comes equipped with a vacuum jacket mechanism to increase heat treatment efficiency and to maintain a stable atmosphere in the chamber. This insulation also ensures efficient cooling of the nitride parts and minimizes oxidization during the process. Other features include an internal electrical heating element, a pyrometer to measure temperatures and a safety control device to keep the machine in check during the nitride process. Overall, KOKUSAI Quixace II Nitride is an advanced furnace designed for efficient and uniform nitriding of metals. Its cylindrical design and range of features makes it suitable for both laboratory and industrial applications. Using this product, users can be assured of an even heat distribution and precise temperature control, resulting in the uniform creation of thin, hard nitride layers.
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