Used KOKUSAI Quixace II NITRIDE #9182061 for sale
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ID: 9182061
Wafer Size: 12"
Vintage: 2007
Vertical LPCVD furnace, 12"
Cartridge heater
Heater control
Over-temperature
Thyristor unit for control
I/O Shutter stage: AGV / PGV / OHT Stage
FOUP Loader
Rotation FOUP storage
FOUP Opener
Wafer detection
Wafer transfer
Variable wafer pitch converter
Boat elevator
Boat changer
Furnace port shutter
Boat rotation
AWTC Port
Flange-upper
Flange-lower
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz boat fixing ring
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz boat fixing ring
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz nozzle 3: D5CP15682
Quartz nozzle 4: D5CP15683
Quartz nozzle 5: D5CP15684
Quartz boat fixing ring
SiC Boat
Quartz outer tube
SiC inner tube
SiC adiabatic plate
Quartz nozzle 1
Quartz nozzle 2
Quartz boat fixing ring
Gas unit (IGS): D4VX38302
Tape heater:
Gas pipe 1: D4EX19130
Gas pipe 2: D4EX19131
Diffuser: D4CX33281
Mass flow controller: FC-PA785T-BW-TC Series
Filter: WGSLS Series
Regulator: PGM Series
Pressure gauge: ZT16-S01
Hand valve: MMGD5-11D-W Series
Check valve 1: MCGP5-F1X1 Series
Needle valve: MMGD5-11D-W Series
Air valve: MAGD5 Series
Connection & fittings: VCR / UPG / SWG
MFC 1: NH3, 0.5SLM
MFC 2: N2, 30SLM
MFC 3: SiH2Cl2, 0.2SLM
MFC 4: SiH2Cl2, 0.2SLM
MFC 5: SiH2Cl2, 0.2SLM
MFC 6: SiH2Cl2, 0.2SLM
MFC 7: NH3, 2SLM
MFC 8: NH3, 0.5SLM
MFC 9: NH3, 0.3SLM
MFC 10: NH3, 0.3SLM
MFC 11: NH3, 0.3SLM
MFC 12: NF3, 1SLM
Vacuum sensor (VG11): 1000 Torr
Vacuum sensor (VG12)
Vacuum sensor (VG13): 2 Torr
Vacuum sensor monitor
Main valve: VEC-SHA8-X0327
Exhaust piping: D4CX38671
Exhaust dilution line: D4CX38671
Reactor tube press leak line: D4CX38671
Jacket heater: 150° C
Exhaust pipe: 150° C
Process effluent trap: MKS
Baratron vacuum calibration port
Inlet flange heater: ESH-12964-01
(2) Injector port heaters:
ESH-12965-01
ESH-12966-01
Seal cap heater: ESH-12450-02
O2 Monitor / Detector
FOUP Opener system
N2 Purge system
Load area MFC
Loading area
Furnace port
Radiator
Filters:
Carbon / Chemical 1 filters
Carbon / Chemical 2 filters
Carbon / Chemical 3 filters
Main operation controller: SW Rev 01.05.05
EDA Controller: SW Rev 01.00.02
DDC Temperature controller: SW Rev 06.00.00
Process module controller: SW Rev 01.05.05
Wafer handling controller: SW Rev 02.04.06
(2) FOUP I/O
FOUP RFID Reader
Wafer mapping sensor: F3M-S1225
FOUP Sensor: E3T-ST11
SECS/GEM Communication: SW Rev 06.01.02
Includes:
Hazardous gases
Manual
Shut off valve
Lock out / Tag out
Electrical: Lock out / Tag out
Robot: Lock out / Tag out.
KOKUSAI Quixace II NITRIDE is a diffusion furnace specifically designed for nitride processing. It is an efficient and reliable tool for the deposition of nitride layers, as well as various metallic and other materials, on substrates. Its advanced design and modular structure provide users greater flexibility in their production processes. The furnace's advanced nitrogen injection equipment ensures that all nitride processes are carried out within the necessary controlled environment. This system is adjustable and can be tailored to the particular process requirements of each substrate, resulting in superior nitride quality and reliability. The unit also provides precise control of diffusion temperatures and times, enabling repeatable and consistent results. The furnace's high performance is further complemented by a wide range of versatile accessories. Among these are a rapid pump-down machine for faster process startups, a titling box chamber for high-temperature annealing, and a lid box oven to facilitate rapid cooling. The included automated gas control tool offers users the ability to preprogram multiple gases for nitride processes. Quixace II NITRIDE also features a range of safety features to help maintain a safe environment. These include a multi-point alarm asset, an interlock diagnostic model, and a process monitoring equipment. All these systems ensure that the user can maintain full control of the furnace during deposition processes. KOKUSAI Quixace II NITRIDE diffusion furnace is an advanced and reliable tool for nitride processing as well as a range of other materials. Its nitrogen injection control system, wide range of accessories, and user-friendly operation contribute to making this one of the most efficient and reliable diffusion furnaces of its kind. Combined with its available safety features, it is the perfect tool for a wide range of industrial applications.
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