Used KOKUSAI Quixace II Poly #293666958 for sale

KOKUSAI Quixace II Poly is a high-performance two-level diffusion furnace designed for high-precision semiconductor device fabrication. It is an ideal solution for producing modern advanced CMOS and 3D IC devices for use in consumer electronics, automotive, and computing applications. Quixace II Poly equipment is capable of delivering a maximum temperature of 1150°C, aiding its exceptional ability to provide rapid thermalization, thermal annealing, and laser metalization processing. The furnace is equipped with an advanced heating system consisting of two pairs of electrical heating elements that is capable of producing very uniform temperatures across the chamber and eliminating hot and cold spots. The heating elements are protected by an integrated quartz-quenchlined thermal shield and are designed to heat the chamber evenly at a rate of 1.5°C/min. KOKUSAI Quixace II Poly is constructed out of stainless steel for improved durability and corrosion resistance and has a dual-level design. The chamber offers several unique features, such as a chimney, high-performance perforated walls, and an integrated atmospheric barrier that prohibit the furnace atmosphere from coming into direct contact with the chamber contents. The chimney is designed to generate a gently downward pressure to improve thermal and vacuum performance within the furnace chamber. The perforated walls are engineered to ensure uniformity of the temperature throughout the chamber and to minimize the temperature gradient to 0.4°C/min. These features, along with the furnace's robust construction, ensure optimum performance in all types of applications. Quixace II Poly offers a variety of diffusion options, including low temperature doping and high temperature oxidation. It is equipped with an integrated 3D cassette-to-cassette wafer transfer unit for improved loading/unloading operations. The machine also includes a touch screen panel display and provides complete monitoring and control of all processes and parameters during each cycle. Additionally, the unit is designed to accept RF systems. These allow for multiple diffusion operations to occur simultaneously within the same furnace, leading to far increased process automation and yield improvement. KOKUSAI Quixace II Poly is a powerful and highly versatile diffusion tool offering dependable performance in a wide range of diffusion processes. It has an excellent build quality and proven reliability making it an ideal choice for medium- to high-volume production environments.