Used KOKUSAI Quixace II Poly #293758334 for sale

KOKUSAI Quixace II Poly is a diffusion furnace and accessory designed for today's semiconductor industry. It is designed to fabricate high-performance integrated circuits and other devices at much faster cycle times than other systems. Quixace II Poly is a batch process furnace that uses furnace gas flow to evenly diffusion source or substrate materials to form the desired structure or device in the desired pattern. KOKUSAI Quixace II Poly is designed with two separate operation modes: single-run and multiple-run. In single-run mode, all of the process gases, openings and heating elements are used in a single process run. The multiple-run mode allows multiple process runs on a single diffusion furnace. During each process run, the user can select flux rates, ramp rates and other parameters to optimize the performance. Quixace II Poly includes an integrated thermal control equipment that can automatically monitor and control furnace temperatures to ensure accurate deposit materials deposition and uniform diffusion. Its precise temperature control system uses advanced PID, PID_TI, and/or Fuzzy Logics to quickly adjust temperatures to the desired settings. KOKUSAI Quixace II Poly offers precise pressure, temperature and flow rate control for precise fabrication process. Its automatic monitoring unit maximizes uniformity, provides feedback to provide real-time feedback information, and controls pressure, temperature and flux rate to precise setpoint values. The gas saver capability offers precise control for higher efficiency and lower power consumption. Quixace II Poly includes an improved loading machine to improve efficiency and reduce handling time. This includes a loading station, unloading station, wafer handling tool and multiple loading and unloading carousel systems. The improved loading asset offers greater reproducibility, reduced wear and tear, better yields, and more efficient handling time. In addition, KOKUSAI Quixace II Poly is designed for easy maintenance and long life. It is designed with an easy-access front panel, a removable top panel, a detachable oven and wafer transfer model for faster servicing, and a modular heating equipment for reduced maintenance and service costs. Overall, Quixace II Poly is an efficient and reliable diffusion furnace and accessory for the semiconductor industry. It offers precise temperature, pressure and flow rate control, improved loading system to reduce handling time, and easy maintenance for long life. It is designed to fabricate high-performance integrated circuits and other devices with consistent results.