Used KOKUSAI Quixace II Poly #9371905 for sale

KOKUSAI Quixace II Poly is a diffusion furnace and accessories specifically designed to produce high-performance vacuum components. This innovative tool boasts a range of features which allow it to fulfill the most demanding production requirements. Quixace II Poly is equipped with a titanium-plated furnace with an inner heat shield, providing increased protection against thermal stress and ensuring high-performance operation. It also has a built-in annealing program, a programmable temperature curve, a consistent temperature control system, and a temperature recovery system for precise heating and cooling of the substrate. Additionally, this tool has a rapid cooling function, offering quick annealing cycles for improved productivity. Furthermore, KOKUSAI Quixace II Poly has a safety-focused design, with a controlled atmosphere, as well as dust and smoke extraction, ensuring optimum health and safety conditions for operators. It has an evacuation device and a vacuum-tight, double-sealing chamber for safety. Additionally, Quixace II Poly is equipped with a water spray protection system, shielding the wafer from heat damage during cooling. In terms of applications, KOKUSAI Quixace II Poly is suitable for use in the production of semiconductors, thin-film devices, and other high-performance vacuum components. It is also ideal for use in research and development of new technologies, as it is capable of heating materials to high-temperatures. In summary, Quixace II Poly is an advanced diffusion furnace and accessories set for high-performance operation. Its advanced, safety-focused design features a programmable temperature curve, an annealing program, and a safety evacuation device, shielding the wafer from heat damage during cooling. It is suitable for use in the production of semiconductors, thin-film devices, and other high-performance vacuum components.