Used KOKUSAI Quixace II #9314230 for sale

KOKUSAI Quixace II
ID: 9314230
Vertical LPCVD furnaces.
KOKUSAI Quixace II is a diffusion furnace and accessory equipment designed for industry-leading materials research laboratories. The system provides precise and reliable thermal diffusion processing in a wide range of materials, from metals to polymers and other ceramics. With KOKUSAI QUIXACE-II, samples can be heated at up to 1600°C in a high-purity, oxygen environment for a wide variety of chemical and structural analyses. Quixace II includes a programmable controller with an easy-to-use graphical interface. This allows users to precisely control their thermal processing by setting the process temperature, time, ramp rate, and other parameters. The temperature is maintained across the sample chamber via a series of actively controlled temperature zones combined with different gaseous atmosphere concentrations such as nitrogen or argon. This method minimizes thermal gradients in the processing chamber, ensuring uniform material processing. The furnace is equipped with an advanced safety unit and is encapsulated in a nitrogen sealed stainless steel housing for maximum protection. The housing also helps keep QUIXACE-II clean by ensuring that its interior is free of dust, dirt, and other contaminants. The machine also comes with a four-channel mass flow controller to accurately and precisely control the flow of inert gases (CO2, N2, etc.), as well as an integrated power supply, sample-loading station, and a vacuum pump with a vacuum level of 10-6 mbar. This pump is used to degas the sample chamber, ensuring a low oxygen concentration in the chamber and ensuring repeatable and reliable results. KOKUSAI Quixace II features a modular design that allows users to upgrade or replace parts with no impact to ongoing operations. This allows users to stay up-to-date with the latest technology and ensures that the tool can meet their changing research needs. Other beneficial features include the Intelligent Automatic Leak Ion Gauge (IALIG) which monitors the temperature and atmosphere of the sample chamber to detect any potential leaks. This asset is complemented by air circulation with a turbo pump for optimal thermal conditions, and a folding flap door. Overall, KOKUSAI QUIXACE-II is a robust and precise model that provides fast, reliable thermal diffusion processes for a wide range of materials. With its state-of-the-art features and easy-to-use interface, Quixace II is an ideal equipment for materials research laboratories seeking to maximize their efficiency and productivity.
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