Used KOKUSAI Quixace II #9384017 for sale

KOKUSAI Quixace II is a diffusion furnace and accessories equipment designed for the production of silicon wafers. It is a powerful and versatile machine that provides an efficient method for depositing thin films and electrical insulation from a gas source. It is suitable for all types of industrial applications, including semiconductor manufacture, advanced material fabrication and research and development. The Kokusais KOKUSAI QUIXACE-II is equipped with a bell jar for enclosure, a taper, a tube, and a replaceable hermetic seal. The bell jar has a large window for observation and the taper tube has been optimized for uniform temperature distribution. The tube has two temperature zones and the seal provides a positive pressure to ensure a reliable gas seal. Inside the bell jar, the Quixace System includes a two-zone reaction chamber and a deposition zone, which are connected by a single circular combustion atomizer. This atomizer is electrically heated and its temperature is independently adjustable. The reaction chamber is equipped with a quartz boat, high-precision temperature control, and rapid reaction temperature changes. The Quixae Unit also features an adjustable gas injector and a gas meter. The injector enables precise gas delivery for all kinds of processes. The gas meter allows the user to monitor parameters such as composition, flow rate, pressure, and temperature. These parameters can be adjusted as needed for different processes. The machine is also equipped with an immersion coil for cooling, a gas vent, a gas condensing tool, an exhaust treatment asset, and a safety model. The immersion coil helps to quickly cool down the equipment and the gas vent is used to vent any hazardous gases. The condensing system is designed to reduce the risk of leaks during the equipment operation. The exhaust treatment unit removes any residual contamination in the exhaust gas, while the safety machine is intended to ensure the safety of personnel and equipment during operation. Quixace II is easy to operate with its user-friendly touch-screen interface. The tool is also designed for remote control and monitoring. The asset will automatically initiate the process once the parameters are set. It can be operated with or without inert gases and the run time for each process is adjustable. Overall, QUIXACE-II is an efficient and reliable machine for silicon wafer production. It is suitable for a variety of applications and capable of handling extreme temperatures and hazardous gases. The model is easy to use and provides precise temperature control, gas injection, and monitoring functions, making it ideal for any industrial production or research and development needs.