Used KOKUSAI Quixace II #9384019 for sale

KOKUSAI Quixace II
ID: 9384019
Vertical furnace Process: ALD TiN.
KOKUSAI Quixace II is a diffusion furnace and accessory equipment designed for semiconductor processes. The system features advanced diffusion processing capabilities that provide high-performance, high-precision processing for optoelectronic materials and devices. It also offers a variety of furnace applications and accessories to suit the needs of diverse processing requirements. KOKUSAI QUIXACE-II diffusion furnace is designed to provide rapid thermal processing with high accuracy and excellent temperature uniformity. It is a digital multi-function furnace that supports a variety of processing modes such as single-barrier, multi-barrier, rapid and slow cool, and fixed-temperature with heating times as short as 10 seconds. The unit supports programmable temperature schedules, as well as manual oven operation. The machine is fully sealed, ensuring a clean environment for diffusion processing. The tool includes a variety of accessories such as electric heating equipment, quartz crucibles, temperature sensors, timers, cooling fans, and more for controlling the temperature or adjusting the processing conditions. These accessories allow the diffusion furnace to be used for a variety of applications, such as oxidation passivation, impurity doping, boron diffusion, and recrystallization. Quixace II diffusion furnace also features safety features such as over-temperature control, temperature stabilizers, and lockout control. It is designed to provide a safe and reliable environment for semiconductor processing. The asset is also compatible with a range of substrates, including silicon, gallium arsenide, indium phosphide, and other optoelectronic materials. It provides excellent results with uniform concentration and process conditions, which gives it the capability to fabricate high-performance semiconductor components. Overall, QUIXACE-II diffusion furnace is a state-of-the-art model that provides advanced processing capabilities, safety features, and excellent performance for semiconductor processes. Its advanced features, accessories, and reliable performance make it the ideal equipment for a wide range of semiconductor applications.
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