Used KOKUSAI Quixace Ultimate ALD SiN #293666963 for sale

KOKUSAI Quixace Ultimate ALD SiN is a diffusion furnace and associated accessories designed to facilitate the doping of SiN films for the use in advanced display and imaging structures. This equipment features a silicon nitride film layer of high temperature tolerance and uniformity for multiple dopant diffusion processes. It also features a heat source of 500 watts to ensure optimal heating of the film layer. This diffusion furnace and accessories is built for rapid, high-precision diffusion of contact layers. The advanced design of the system helps reduce impurity diffusion which is essential to maintain electrical properties of the SiN layer. The unit also offers precise temperature control and rapid heat up and cool down cycles. Quixace Ultimate ALD SiN machine is designed for utilization in semiconductor, display, and imager applications that require a uniform film layer with excellent resistance to wear and contamination. This tool offers three different temperature profiles to ensure the accuracy of the doping process. These are: forward bias, reverse bias, and ramped temperature. The forward bias profile allows for the fastest temperature ramp up for highest temperature processes while the reverse bias provides increased control for accurately controlling layers of reagents for dopant application. The feature of ramped temperature allows for a gradual temperature increase to avoid substrate damage. KOKUSAI Quixace Ultimate ALD SiN also offers a variety of accessories designed to improve the accuracy of the doping process and ensure successful processing. These include a pressure monitor and micro-heaters designed to precisely control thermal gradients and improve uniformity, and the ALD diagnostic tool for quantitative analysis and diagnostics of the dopant profile. Finally, Quixace Ultimate ALD SiN asset is engineered for low cost of ownership and ease of operation. A multi-chamber design allows for multiple wafers processing in a single or dual chamber without utilising additional hardware. An easy to use interface provides users with an intuitive interface and process control. KOKUSAI Quixace Ultimate ALD SiN model is a convenient and cost-effective alternative for dopant processing of SiN films in a variety of semiconductor, display, and imaging applications.