Used KOKUSAI Quixace Ultimate ALD SiN #293818331 for sale

KOKUSAI Quixace Ultimate ALD SiN is a diffusion furnace and accessory designed for advancedLocal-Oxide jacketed epitaxial Growth (ALD). This setup utilizes the piezoelectric effect of local oxide films to deliver high quality epitaxial films with uniform properties across the wafer. The SiN diffusion furnace is capable of processing up to five wafers simultaneously, and can handle up to 1000°C temperatures. The equipment is optimized for homogeneous oxide films and minimal resistivity across the wafer. The diffusion furnace utilizes the piezoelectric effect of local oxide jackets to grow epitaxial films up to 2 microns thick. It is equipped with a 75mm pitch and a quartz heat source for increased thermal stability. The cantilevered-plate reverser mechanism ensures homogenous films with uniform properties. Additionally, the growth rate of the oxide film can be precisely controlled with anisotropic oxidation yield (AOY) and patterned oxidation control (POC) settings. The high-energy plasma generator creates a highly energetic plasma flow that is collimated to the wafer. This ions bombardment speeds up the growth of oxide film, coupled with the localized oxidation rate of the wafer. In addition, the diffusion furnace also uses a microwave plasma to enhance the rate of oxidation with precise control. The plasma generator also enables the system to achieve controllable oxidation rates of up to 5000-10000 Angstroms per second. The unit is equipped with a special exhaust machine that is designed to reduce air contamination. The air is constantly drawn through the furnace, and chamber pressure is constantly maintained in N2/H2 atmosphere, reducing chances for contamination via air. The filter also helps reduce oxide dust in the exhaust. The furnace is designed with a chamber tilt tool to enable easy access to the asset during maintenance. The tilt chamber comes with a built-in safety latch, and provides a multi-directional access to the model for inspection and repair. The cutting-edge technology of Quixace Ultimate ALD SiN gives the user the ability to create high-quality, uniform epitaxial films with precision and minimal resistivity. The easy maintenance and exhaust equipment design further increases the value of this system, giving the user an efficient and reliable diffusion furnace.