Used KOKUSAI Quixace Ultimate ALD SiO2 #9203703 for sale

KOKUSAI Quixace Ultimate ALD SiO2 is a highly advanced diffusion furnace, designed to meet the exacting requirements of modern device fabrication. It offers superior temperature performance, superior uniformity and superior chamber geometry, all in the smallest chamber of its kind. The Ultimate ALD SiO2 provides superb thermal uniformity, with a temperature accuracy of 0.01 °C. With its specialized process control equipment, it can handle a range of operations consisting of CVD, ALD, and advanced oxidation. Its unique chamber geometry also makes it possible to achieve excellent film uniformity over a large area. Its revolutionary rotating cathode allows for evenly distributed electrodes, allowing for fast and consistent film deposition. The auto-cleaning system and an earthing device further add to its reliability. Quixace Ultimate ALD SiO2 is a perfect choice for the most exacting requirements of modern fabrication processes. The device comes with a number of advanced features, such as an automated control unit, a rotating cathode, superior uniformity and excellent thermal control. It is uniquely designed to provide high consistency and low thermal gradients. Furthermore, the chamber geometry is designed to provide superb uniformity of film across a large area. Additionally, the Ultimate ALD SiO2 comes with an effective clean-in-place machine and an earthing device. KOKUSAI Quixace Ultimate ALD SiO2 is an ideal tool for the advanced device fabrication process. It provides superior temperature control and uniformity and is most suitable for CVD and ALD processes. Its unique chamber geometry also makes it possible to achieve excellent film uniformity over a large area. The rotating cathode allows for evenly distributed electrodes and the CLEAN-IN-PLACE tool ensures maximum hygiene. This advanced asset ensures a reliable and trouble-free process for device fabrication.