Used KOKUSAI Quixace Ultimate ALD SiO2 #9372767 for sale

KOKUSAI Quixace Ultimate ALD SiO2 is an advanced atomic layer deposition (ALD) furnace designed to deposit ultrathin films of silicon dioxide (SiO2) for a wide range of applications. It is well-suited for customers who require high-quality thin films, high productivity and excellent uniformity. This equipment is an ideal choice for semiconductor, MEMS, photovoltaic, microfluidic and display devices. Quixace Ultimate ALD SiO2 is equipped with a state-of-the-art multi-zone chamber design, allowing for precise and uniform temperature control across the deposition area. This ensures highly consistent film thickness across the substrate, even when using materials that differ greatly in their reactivity. The system also features dedicated inlet and outlet positions which control purge time and chamber pressure. These features allow the unit to handle hydrogen and chlorine-based precursors with fast recovery time and low methane deposition. KOKUSAI Quixace Ultimate ALD SiO2 machine boasts an outstanding uniformity of sub-7 nm thickness over large wafers. It also utilizes 400 Hz frequency for extended deposition time, giving it higher throughput compared to other systems. Additionally, it has enough room to accommodate large substrates, up to 8" in diameter. This makes it suitable for high-volume production of devices on large-scale substrates. The Quixace's self-optimizing process control features provide users with real-time data and feedback on process parameters, ensuring consistent high-quality films. This tool is also designed to minimize the leakage of hazardous gases, preventing environmental pollution and protecting operator safety. In addition to Quixace Ultimate ALD SiO2 asset, KOKUSAI also offers a number of optional add-ons. These include accessories such as a pyrometer, quartz cassette and substrate holder, RF power supply, an ionizing voltage generator and a rotating substrate holder. Together, these provide users with a comprehensive solution that meets the needs of any ALD application. KOKUSAI Quixace Ultimate ALD SiO2 is an advanced product and the best model in its class. It has been designed to provide users with reliable and highly efficient ALD deposition processes. It is a great choice for customers who require high-quality thin films with excellent uniformity and fast deposition time. Complete with its optional add-ons, Quixace Ultimate ALD SiO2 is perfect for any advanced ALD application.