Used KOKUSAI Quixace Ultimate ALD SiO2 #9404255 for sale

KOKUSAI Quixace Ultimate ALD SiO2 is an advanced diffusion furnace and accessories used for advanced material fabrication. This equipment uses plasma enhanced chemical vapor deposition (PECVD), which is a physical vapor deposition (PVD) technique to deposit materials on surfaces in vacuum. The system utilizes a 13.56 MHz R.F. generator to create a high quality, plasma enhanced chemical vapor deposition to deposit materials on surfaces in vacuum. The unit also has a quartz reactor chamber, a halogen lamp to preheat samples, a helium leak detector, a vacuum chamber and a controller to regulate temperatures, pressures, and RF power. Quixace Ultimate ALD SiO2 machine is capable of depositing a variety of materials, including Aluminum, Titanium, Silicon, as well as various polymers (such as PTFE, PP, and PMMA). The tool also features a unique dual process chamber design that maximizes chamber utilization and provides an optimized process sequence. This allows for a faster deposition cycle time and quicker turnaround time. The asset is ideal for creating deposits using dielectric, conductor and semi-conductor materials all in one process. The deposits created on the surface will form a uniform, protective layer and will be resistant to oxidation, scratches and abrasion. This can be used for a variety of applications, such as in electronics, solar cells, medical implants and protective coatings. KOKUSAI Quixace Ultimate ALD SiO2 is a reliable and cost effective method for micro and nanotechnology fabrication. The model is a great choice for users that are looking for a flexible and efficient equipment for their process needs. The system is reliable, has easy to access accessories, and is user friendly and easy to operate. It is also backed by a reliable customer service and is capable of producing high quality results with minimal process time.