Used KOKUSAI Quixace Ultimate #9121959 for sale

KOKUSAI Quixace Ultimate is an advanced diffusion furnace equipment and accessories used in advanced semiconductor processing. The system is equipped with high-level thermal uniformity control and heating elements, allowing the widest range of temperature settings for production wafers. The advanced process controls provide reliable wafer uniformity for doped, undoped, or difficult to process Silicon materials. The unit features superior temperature uniformity and heating elements for processing various types of materials such as mono-crystalline, multi-crystalline, and Strained Silicon. The machine features two furnace chambers: one large chamber for pre-anoization processes and one multi-zone chamber for diffusing implants with a wide range of temperature settings up to 1100°C. The furnace tool provides advanced process performance, including high throughput and throughput uniformity. The asset is sealed with an API gas control model for high gas flow through rates, enabling ultra-short thermal cycles. This equipment also offers advanced temperature feedback control, precise spatial uniformity and process optimization. An additional benefit of this system is low thermal stress during the diffusion process due to the close tolerance of the silicon heating elements and the absence of thermal insulation. The furnace unit is monitored and controlled with advanced proprietary process software, providing real-time process monitoring for production tracking and quality control. The software can also be used for process optimization for higher yields and better process performance. Quixace Ultimate machine is an ideal choice for semiconductor processing, particularly for advanced diffusion furnace processing. It is designed to provide superior temperature control and enhanced uniformity with a wide range of temperature settimgs for many types of materials. With its advanced process control, wide temperature range and high throughput, KOKUSAI Quixace Ultimate tool makes an ideal choice for semiconductor production.