Used KOKUSAI Vertron III / DJ-803V #9270558 for sale
URL successfully copied!
ID: 9270558
Wafer Size: 8"
Vintage: 1999
Vertical LPCVD furnace, 8"
Process: LPCVD Nitride
CX2001 System controller
SECS/GEM Communication: Load station
BROOKS SMIF Loader
MIDAS Gas detector: Process gas detection module
N2 Purged load lock
WIP Carrier storage capacity: 8"
Wafer spacing: 6.5 mm
Load size: 125 Slots
Boat rotation
Furnace:
CQ1501A Temperature controller
(4) Zones
D4EX02626 Heater: Mid temperature
Process temperature: 650°C-780°C
Flat zone length: 1200 mm
QUARTZ Process tube material
QUARTZ Wafer boat material
Tube seal: O-Ring seal (Viton)
Temperature control methodology: Closed loop (PID)
Thermocouple type: R-Type
Process gas control system:
Process gases (LPCVD):
HORIBA STEC Z500 MFC
Process gases: DCS, NH3
Other gases: N2
Process pressure control system:
EDWARD QDP80 Vacuum pump
Dry pump capacity: QMB1200
Fore line size: 80
CX1204 Pressure controller
Process manometer
Pressure differential manometer
Pump manometer
Inline cold trap
Exhaust controller
BROOKS SMIF Loader (Left/Right):
Integrated and base mounted with cassette optical light sensor detection
Heater voltage: 280 VAC, Single phase, 42 K A/C
Controllers: 100 VAC, Single phase, 10 K A/C
Clean unit: 100 VAC, Single phase, 10 K A/C
1999 vintage.
KOKUSAI Vertron III / DJ-803V diffusion furnace is a versatile and highly reliable production-level diffusion equipment with the proven quality of KOKUSAI semiconductor equipment. The system features a high-power Top Side Heater (TSH) and Bottom Side Heater (BSH) with uniform temperatures up to 1180℃, along with a heated furnace lid, allowing for high-temperature uniformity and fast thermal soak times. The KD-101E control unit features an easy-to-read LCD touch panel display, giving full control over up to five programmable recipes and a wide range of options. The furnace also contains two independent cooling fans, offering excellent temperature control and repeatable results. In addition, the DJ-803V is equipped with advanced safety features, including an oxygen sensor and automatic shutoff if the oxygen level falls below a specified setpoint. The machine offers precise temperature control for precise processing of any application, including uniform high-temperature oxide film and precise phosphorus diffusion. The built-in flat-wafer capability of KOKUSAI VERTRON III DJ-803V allows for effective and uniform processing of large wafer sizes up to the maximum size of 6" in diameter. The internal temperature control of this tool makes it well-suited for applications such as diffusion, oxidation and annealing, as well as in-situ doping with precise and highly repeatable results. In addition, Vertron III / DJ-803V can be equipped with various optional accessories to meet individual customer needs. These options include nitrogen sources for cleaning the furnace chamber, stainless-steel wafer carriers, low-temperature devices, heavy-duty lifting pins, vacuum-pressure systems and advanced cooling fans. The optional accessories make the asset highly versatile and capable of handling a variety of processing needs. VERTRON III DJ-803V is an ideal model for low-temperature and high-temperature diffusions, as well as device fabrication needs. The reliable and consistent performance of this diffusion equipment make it a cost-effective production-level solution that is up to the task of precision and high-quality diffusion processing.
There are no reviews yet