Used KOKUSAI Vertron III #9078066 for sale

KOKUSAI Vertron III
ID: 9078066
Vintage: 1998
Vertical diffusion furnace VDF-CVD-NITRIDE 1998 vintage.
KOKUSAI Vertron III is a diffusion furnace, designed for ultra-high-vacuum precision deposition of a wide range of materials. This versatile and robust equipment provides reliable performance for critical applications in semiconductor and MEMS device manufacturing. Vertron III (KV3) has a temperature range of 700°C to 1100°C. It is fitted with a zirconia-shell safety shield, allowing it to maintain an ultrahigh vacuum atmosphere while in operation. This special shielding allows it to achieve low contamination levels and low particle count necessary for the deposition of both high- and low-temperature materials. The system also comes with a number of control features, such as a high-temperatureable Reaction -Quench- Transporter (RQT) unit for controlling reaction temperatures, as well as a multiple-temperature Zone Control Program for separately controlling different layers of materials and a temperature range of over200°C in a single operation. The machine also includes a high-temperature Overflow Atom Reception Panel (OARP), capable of performing at temperatures over 1100°C, thereby helping to ensure uniform deposition results. The tool also features an automatic wafer transport loader, enabling automated loading and unloading and a low-pressure supply asset for filtration of carrier gas. In addition, the model is also equipped with an Automatic Deposition Control Equipment (ADCS), providing precise control of film thickness and ensuring stable deposition processes. A high-accuracy, real-time measurement system is also incorporated, allowing for rapid, precise, and consistent results. A temperature control unit is also included in the machine, creating a well-balanced temperature profile across the tool and ensuring uniform deposition results. KOKUSAI Vertron III is suitable for use in ultra-high vacuum systems and enables production of both metallic and non-metallic coatings on a wide variety of substrates. It is equipped with many state-of-the-art features that make it capable of producing high-precision deposits and is the perfect choice for manufacturers looking for the perfect combination of performance and quality.
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