Used KOKUSAI Vertron III #9176827 for sale

KOKUSAI Vertron III is a diffusion furnace equipment designed for high-temperature processes. This reliable annealing system is equipped with a high-performance preheating chamber, oxidation chamber, and insulation dryers for optimum temperature control, enabling superb performance and cost-effectiveness throughout the entire diffusion cycle. It also features advanced manipulator tracking and data collection technology to ensure efficient and consistent annealing processes. The preheating chamber of Vertron III is used to increase the temperature of the substrate material before the diffusion process. The chamber is equipped with electronically-controlled heating elements in both sides to enable smooth and accurate temperature control throughout the process. It also includes a built-in oxidation chamber to help reduce the risk of oxidation and degradation of the substrate material during the diffusion process. Finally, the insulation dryers provide increased temperature uniformity and thermal protection throughout the unit, as well as aiding air circulation. KOKUSAI Vertron III also includes advanced manipulator tracking technology to ensure consistent and dependable results. The programmed manipulator is equipped with a digital servo control machine which measures movement accurately with minimal fluctuation, and allows for precise feedback control for consistent annealing results. It also features a data collection tool which gathers and displays various annealing parameters such as pressure, temperature, and current along with actual values for each data point. This greatly aids in the optimization of the diffusion process, allowing for better process management and repeatability. Vertron III is a reliable, high-performance diffusion furnace asset ideal for a variety of high-temperature annealing processes. It is equipped with a preheating chamber, oxidation chamber, and insulation dryers and features advanced manipulator tracking and data collection technologies for efficient and consistent annealing. This robust model provides improved temperature uniformity and thermal protection as well as superior process control and repeatability, making it an excellent choice for any annealing application.