Used KOKUSAI Vertron III #9246752 for sale

KOKUSAI Vertron III is a diffusion furnace and accessories designed by KOKUSAI Electric Co., Ltd. for the production of advanced semiconductor devices. The equipment utilizes an advanced closed-loop thermal control system to maintain accurately controlled temperatures inside the furnace for maximum control and wafer production. Vertron III is outfitted with an advanced dual zone design that is capable of supporting two different temperature zones while still retaining great accuracy and uniformity. This allows for high quality wafer production and greatly reduces cycle times when entire lots of wafers are being processed. The furnace is capable of supporting both batch and single wafer processing depending on your application. The single wafer mode enables quality assurance by allowing you to set the exact temperature for each wafer when it is processed. The batch mode is perfect for larger jobs as it ensures uniformity across the entire batch. KOKUSAI Vertron III is powered by an advanced automated control unit. This machine is responsible for automatically monitoring the furnace's performance and adjusting its settings to maintain reliable, consistent temperature regulation. This ensures that all wafers are processed evenly and quickly. The tool also includes sophisticated mapping and tracking capabilities. These features enable detailed temperature profiling of the furnace and help to optimize the heating profile for your application. Additionally, these features are capable of automatically adjusting the asset to adjust to changes in the ambient environment. Vertron III is outfitted with a variety of compartments which enable it to handle complex applications and a range of processes. These compartments provide additional insulation to improve uniformity and ensure that your wafers are being evenly processed. Overall, KOKUSAI Vertron III is a highly efficient diffusion furnace model designed for high volume production. The advanced features and controls enable a high level of accuracy and precision, ensuring uniform, consistent results. The dual-zone design is perfect for both single and batch wafer processing and the automated control equipment enable automated real-time adjustments that ensure optimal production.