Used KOKUSAI Vertron IIIA #293592150 for sale

KOKUSAI Vertron IIIA diffusion furnace and accessories is an advanced, automated equipment consisting of an integrated, programmable controller, diffuser, and chamber. Used for microstructural analysis, Vertron IIIA is designed to give precise single-point or total dose signal control for a variety of applications. At its core, KOKUSAI Vertron IIIA features a diffusion furnace, where a heat transfer medium is used to diffuse heat accurately and precisely. This process includes a temperature control, allowing the user to quickly adjust the temperature and maintain it at the selected level without risk of overheating. The chamber also features two compact, symmetric pockets to hold samples, acting as a sample holder to both pre-heat the samples and prevent decarburization. The system includes an integrated programmable controller. The control unit is built into Vertron IIIA and allows users to control the process parameters such as time and temperature, making it extremely user-friendly. Furthermore, the unit also contains a powerful power supply to handle precise voltage changes and regulate the energy to the precise requirements for the diffusion process. The diffusion furnace also is equipped with a high-precision diffuser designed for precise temperature control and precise particle size distribution. Utilizing the diffuser, users can easily adjust the particle size distribution for their process. This capability is key for achieving uniform and precise nucleation and crystallization, a necessary step for successful device fabrication. KOKUSAI Vertron IIIA diffusion furnace and accessories also includes a high-performance access-monitoring machine, allowing users to track the progress and parameters of the diffusion process. This access-monitoring tool displays raw data, trends, and information in an easy-to-interpret format, allowing users to quickly identify any deviations. In conclusion, Vertron IIIA diffusion furnace and accessories is an advanced asset designed to provide precise single-point dose signal control and precise temperature control. With the monitoring model and integrated programmable controller, users can quickly adjust the necessary parameters and achieve precise nucleation and crystallization processes.