Used SVG / THERMCO / AVIZA 5000 #9195863 for sale

SVG / THERMCO / AVIZA 5000 is a high performance diffusion furnace and accessories for semiconductor manufacturing. The furnace is designed for controlled diffusion, annealing, and oxidation processes. It features advanced furnace design and processing flexibility, enabling precision temperature control and excellent temperature uniformity throughout the entire thermal mass. Its advanced dual-chamber construction, with a heated billet transfer chamber, provides maximum insulation and control of the thermal environment as well as superior process uniformity. The SVGTSVG 5000 is equipped with a high-performance susceptor, enclosed by a single crucible insert and Isothermal Jacket, allowing for precise temperature control and decreased thermal fouling. The furnace includes automated and manual pumping systems, electronically controlled inert gas, and advanced temperature and pressure monitoring capabilities. The furnace also features a 5-zone programmable heaters, enabling precise temperature control up to 2000°C. The heating zones are divided into three inner and two outer zones, providing optimal temperature uniformity and control as well as reduced gradients. The independently adjustable and programmable inner zones are designed to reduce thermal transfer times and produce more consistent performance. The furnace also includes a range of additional process functions such as advanced safety monitoring and alarm capabilities, including PID temperature control and over-temperature protection. Additionally, the furnace includes an oxygen purging/reduction system, enabling effective control of oxidation process. To ensure repeatable performance and consistent, reliable results, the furnace is built with an advanced insulation and cooling system. The construction features an epoxy filled double modular insulated chamber and an integrated PCR cooling system that provides uniform cooling throughout the entire thermal mass. The insulation provides better temperature uniformity within the process chamber and efficient cooling, helping to ensure the performance of process reproducible at even the highest temperature settings. The furnace is easy to use, with a large touchscreen interface offering a range of advanced process functions, intuitive programming and control, automated wafer handling systems, and online monitoring and diagnostics. The user interface is designed for ease of use, with intuitive controls and displays that make it easy to create, monitor and adjust recipes. The furnace is designed for demanding production and research applications, providing fast, repeatable and reliable performance.