Used SVG / THERMCO / AVIZA VTR 7000 #9168601 for sale

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ID: 9168601
Wafer Size: 6"
Vertical LPCVD furnace, 6" Process: Poly (1) Chamber (1) Mainframe EDWARDS iQDP80 / QMB500 Pump Gas manifold box TEOS Transfill Transformer Power control unit.
SVG / THERMCO / AVIZA VTR 7000 is a single-chamber horizontal diffusion furnace designed for growing thin film materials. This diffusion furnace has a maximum temperature of 2500 degrees Celsius and features a Rapid Thermal Processing (RTP) capability for rapid heating and cooling cycles. SVG VTR 7000 is ideal for applications requiring Uniform Rapid Heating (URH) and rapid temperature cycling with accuracy. It provides precision-controlled thermal process sequences and pressures with a high degree of repeatability and reproducibility. AVIZA VTR 7000 is constructed of pure molybdenum with stainless steel-clad walls. It has an overall size of 10.5"W x 10.5"L x 9.9"H, and a heated zone of 9.90"W x 9.90"L x 4.75"H supported by a stainless steel chamber base. It has a pressure rating from atmospheric to 0.7 Torr and requires a 208V, single phase power supply. THERMCO VTR 7000 is equipped with a Nooter-Erickson Rapid Thermal Processing Equipment, which includes a fast-acting single-connect heater and high-speed timer-based controller. The heater is designed to accurately and quickly heat the chamber to setpoint temperature levels within a few seconds, and the controller is designed to optimize the temperature profile with built-in programs. This system also includes an automatic thermal shutoff switch at 2550°C to prevent overheating of the furnace chamber and heater. VTR 7000 includes a brazed exhaust unit with a ceramic bubbler chamber, a stainless steel ceramic lab connection, and a vacuum-tight seal. The exhaust machine allows clean emissions to be removed from the chamber, preventing toxic fumes from entering the laboratory environment. In addition, a quartz viewport offers observation of the process chamber. SVG / THERMCO / AVIZA VTR 7000 also features a high-precision temperature controller with a digital display and digital setpoint control. The temperature can be easily adjusted from atmospheric pressure to 0.7 Torr with an accuracy of +/-3°C and repeatability of +/-0.5°C. Also included are 0-50 A.F. power, digital vacuum readout, and optional forced-air and nitrogen purging of the chamber. The use of SVG VTR 7000 diffusion furnace and accessories allows for processes such as atomic layer deposition (ALD) and chemical vapor deposition (CVD) with better accuracy and control than traditional production methods. It eliminates variations in temperature between the process chamber and the heater, and is capable of producing thin films with precision and repeatability. This makes it a reliable and cost-effective choice for producing thin film materials.
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