Used SVG / THERMCO / AVIZA VTR 7000 #9398904 for sale

SVG / THERMCO / AVIZA VTR 7000 is a reliable and versatile diffusion furnace and accessory system. It is specially designed to quickly and accurately deposit high-temperature and very thin dielectric layers onto a wide variety of spin-on uniform layers. This diffusion furnace is used commonly in the semiconductor, photovoltaic, LED, LED packaging, and optical coating industries. SVG VTR 7000 is a closed and ventilated modular chamber configuration. It offers four controlled environment process chambers, and each chamber can independently control each of the process steps. The four chambers are the Preheat Chamber, Annealing Chamber, Diffusion Chamber, and Nitride Chamber. The chamber configuration is designed to reduce exposure to volatile organic compounds (VOCs) and provide a safe working environment. The Preheat Chamber of AVIZA VTR 7000 is designed for pre-oxidation and diffusion, with a temperature range of 350-800°C (662-1472°F). This chamber is used to provide the necessary environment for surface preparation and pre-treatment, before any process steps. In this chamber, the substrate is heated up quickly and evenly over the entire area. The Annealing Chamber is designed for thermal annealing and surface oxidation, with a temperature range of 350-900°C (662-1662°F). This chamber is used to set the temperature of the wafer and to initiate the subsequent processes. This Chamber also achieves improved oxidation uniformity and increased oxidation stress stability. The Diffusion Chamber is designed for drift oxidation and diffusion, with a temperature range of 400-980°C (752-1796°F). This chamber creates a low-pressure gradient environment, using inert gas and inert gas combinations to deposit dielectric layers. It also creates the necessary environment for drift oxidation and the diffusion of dopant species into the silicon layers. The Nitride Chamber is designed for nitride annealing and surface protection, with a temperature range of 400-950°C (752-1742°F). This chamber performs post-drift oxidation nitride annealing and protects the surface from further oxidation. THERMCO VTR 7000 provides a total throughput of up to 1400 Substrates per hour, a uniformity of ±2% (1σ single deviation) of film thickness over a 4-inch wafer, and is capable of depositing very thin layers (down to 25 nm). The system is also equipped with automatic wafer transfer platters, a quick cool-down feature, automatic resistance measurement, and the ability to connect to a PC for data logging. This reliable, cost-effective, and high-performance diffusion furnace and accessory system is a must-have for any modern processing environment. With its tight process control and total throughput capabilities, VTR 7000 is an excellent diffusion device for a variety of applications.