Used SVG / THERMCO Ranger 3000 #9256561 for sale

SVG / THERMCO Ranger 3000 is a diffusion furnace and accessory package suitable for wafer and die-level semiconductor processing applications. The result of a joint venture between two leading microwave equipment manufacturers, SVG Ranger 3000 provides a wide range of features and benefits to support contemporary applied research, materials processing, and product prototyping requirements. THERMCO Ranger 3000 is an advanced-design continuous-flow diffusion furnace that delivers excellent homogeneity and economical deposition rates. This controllable diffusion furnace is designed to provide precise physical vapor deposition characteristics over an extended range of process temperatures. The design incorporates an array of advanced features, such as direct drive motors and dual temperature control zones, to ensure optimal diffusion performance. Thermocouple monitoring and closed loop control options permit direct feedback from the furnace chamber, increasing precision and accuracy for deposition and annealing applications. This high-precision design also helps reduce thermal fluctuation risks, ensuring repeatable wafer-level results. Ranger 3000 also features wide dynamic temperature range (600°-1200°C) with 0.1°C accuracy, multiple gas sources and gas mixability, and a Wide-Band-Gap Dynamic Flow-Averaging technology that allows uniform in-situ axial temperature profiles. SVG / THERMCO Ranger 3000 includes an array of accessories, including a quartz torch, sample baskets, holders, support rods, and a reliable RF impedance-matching system. The quartz torch is integrated with the diffusion source in order to precisely deposit uniform deposition layers, while the ancillary components are designed to efficiently process and place wafers for deposition. The accompanying RF impedance-matching system performs admirably in all types of deposition processes, providing efficient and accurate discrimination of wafer and die-level substrates. In sum, SVG Ranger 3000 is an advanced-design continuous-flow diffusion furnace and accessory package well suited for a wide range of research, materials processing, and product prototyping applications. The precise physical vapor deposition characteristics, excellent homogeneity, precise temperature control, and an array of accessories make this system a reliable and cost-effective solution for many contemporary semiconductor needs.