Used TEL / TOKYO ELECTRON Alpha 8S #104721 for sale
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ID: 104721
Wafer Size: 8"
Vintage: 1994
High-temp furnace, 8"
Process: Oxide
8 cassette stockers
Frequency 60 Interface.-Cassette ¡V 8"-Phase -3 Voltage, 208V
Facilities entry at bottom
Wide Body style, Right sided
Brooks 5964 MFCs
MFC 7 HCl 1 slm
MFC 6 O2 1 slm
MFC 5 O2 20 slm
MFC 4 H2 10 slm
MFC 3 Ar 20 slm
MFC 2 N2 5 slm
MFC 1 N2 20 slm
TS-4000SZ Furnace controller
Varian TEL LR300 Temperature controller
AP Tech O2 and H2 flow switches
HEL Pyro Control
Touch screen operator interface
Load Size 100 wafers-(upgradeable 150)
1200 C Heater Core
Lip Seal, Inner T/C, Linear aligner UP/DOWWN axis slide motions
No variable pitch. Single or five (5) wafers
Boat, CLN ON 07-00202
Cover, Pedestal 07-00204
Pedestal 07-00205
PFA tube (6.35x4.35x1.0T) 06-22014-00-16 inch process Tube
Rapid Cooling
System power rating: 3 Phase, 208 V, 60 Hz
1994 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a multi-zone diffusion furnace and its accessories primarily used in semiconductor processing. The furnace is a horizontally-oriented, PC-controlled furnace that consists of an inner process chamber and an external shell. TEL ALPHA-8S is capable of processing small-scale samples such as workpieces, substrates and dies, with a maximum size of 25mm x 25mm x 10mm. The process chamber is constructed from aluminum alloy and it has an inner volume of 640x550x3.5mm (L×W×H). The heating zone is composed of up to 6 heating stations with top and bottom fans to regulate the temperature for optimized uniformity. The heating elements use Kanthal type with a maximum power rating of 4kW. The furnace is fitted with two independent temperature control systems, one for the steady state temperature and the other for rapid thermal ramping or cooling. The temperature accuracy is ±1°C on the steady state and ±3°C on the rapid thermal ramping. The accuracy can be maintained even when the temperature increases to 200°C (392°F). The process of TOKYO ELECTRON ALPHA 8 S is controlled by the high-end PC controller which allows high-speed data acquisition and display. The data acquisition is reliable and intelligent with multiple sets of recipes and parameters. It offers a sophisticated user interface and operation menus, optimized for quick and easy operation. TEL ALPHA-8 S can be used to process other materials such as gold, copper, aluminum, and tin as well. The diffusion process of ALPHA-8 S can be customized according to the requirements of the specific process. The accessories of TEL / TOKYO ELECTRON ALPHA-8 S system include a manually tested gas flow meter, gas accumulator, thermal insulation cover, gas flow regulators, gas pressure switch and a purge gas bottle. In conclusion, TEL / TOKYO ELECTRON ALPHA 8 S is a multi-zone diffusion furnace with an aluminum alloy interior for small samples. It features two independent temperature regulation systems, adjustable fans for uniform temperature control, a high performance PC controller for data acquisition and display and various customizable processes. The accessories also help maximize the performance of ALPHA 8 S and make it an ideal choice for semiconductor tool processing.
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