Used TEL MATr 8000 #293718846 for sale

ID: 293718846
Magnetic annealing system Magnetic field: 0 to 8.0 Tesla Circular diameter: Ø2° (51 mm) Field homogeneity: -2/+2% Field uniformity with angle: < ±1.5° Set-point accuracy: < 5 m Tesla Field stability: < 0.1% Field reproducibility: <5 m Tesla Temperature range: 200-450°C Maximum wafer exit temp: 60°C Thermal uniformity: <±3°C Set point accuracy: ±1.5°C Cross stack uniformity: ±1.5°C.
TEL MATr 8000 is a high-performance, advanced diffusion furnace designed to meet the demanding needs of the semiconductor industry. This state-of-the-art furnace is equipped with a range of innovative features and capabilities that make it a versatile and reliable tool for a variety of diffusion processes. At the heart of MATr 8000 is a precision-controlled heating equipment that ensures uniform and consistent temperature distribution across the wafer surface. This is critical for achieving precise and repeatable diffusion profiles in the doping process. The furnace is capable of reaching temperatures up to 1200 degrees Celsius, making it suitable for a wide range of high-temperature processes. TEL MATr 8000 features a vertical furnace design, which allows for easy loading and unloading of wafers through a front-access door. This design also minimizes the footprint of the furnace, making it ideal for cleanroom environments where space is limited. The furnace chamber is made of high-purity quartz, which ensures excellent thermal stability and resistance to chemical reactions. One of the key advantages of MATr 8000 is its advanced gas delivery system, which allows for precise control of the gas flow rates and concentrations during the diffusion process. This is critical for achieving the desired doping profiles and minimizing defects in the semiconductor material. The furnace is equipped with multiple gas inlets and mass flow controllers, allowing for a high degree of flexibility in process development. In addition to its core heating and gas delivery capabilities, TEL MATr 8000 is also equipped with a range of accessory modules that further enhance its performance and versatility. These include a rapid thermal annealing module for post-diffusion processing, a wafer cooling module for rapid cooldowns, and a process monitoring unit for real-time feedback on process parameters. MATr 8000 is controlled by a sophisticated software machine that allows for easy programming of process recipes and monitoring of key parameters in real-time. The software interface is user-friendly and intuitive, making it easy for operators to set up and run diffusion processes with minimal training. Overall, TEL MATr 8000 is a highly advanced and reliable diffusion furnace that offers unmatched performance and flexibility for a wide range of semiconductor processing applications. Its precision-controlled heating tool, advanced gas delivery asset, and range of accessory modules make it an ideal tool for achieving precise and repeatable diffusion profiles in the fabrication of advanced semiconductor devices.
There are no reviews yet