Used TEL / TOKYO ELECTRON A303I-KVCKN #9381808 for sale

TEL / TOKYO ELECTRON A303I-KVCKN
ID: 9381808
Wafer Size: 12"
Vintage: 2006
Furnace, 12" Process: DCS-HTO Heater type: VOS-56-003 Gas: NH3, SiH2Cl2, N2O, SiH4 2006 vintage.
TEL / TOKYO ELECTRON A303I-KVCKN is a diffusion furnace and accessorie used to create high quality, integrated circuit components. Designed and manufactured in Japan, TEL A303I-KVCKN is a powerful and efficient diffusion processing system. TOKYO ELECTRON A303I-KVCKN consists of four main components: a vertical furnace that can reach temperatures up to 1150°C, a quartz tube-shaped evaporator, a vertical susceptor, and an array of skimmer and concentrator tools. The vertical furnace is used to create a heated environment, which helps ensure uniform temperature and process control. The quartz tube-shaped evaporator vaporizes source material, which is then controlled by the vertical susceptor, which can tilt to adjust the concentration of materials throughout the process. The skimmer and concentrator tools work together to ensure accurate distribution of materials in order to optimize surface uniformity and adhere to the desired electrical properties. A303I-KVCKN can be used for various applications, including producing high-density, ultra-thin film layers for photovoltaics, electronic device manufacturing, and integrated memory components. It enables cost-effective wafer manufacturing and can be used for short-time processes such as planar and trench isolation, annealing, thermal oxidation, nitride doping, and diffusion. Additionally, TEL / TOKYO ELECTRON A303I-KVCKN is compatible with a range of materials, including high-purity silica and silicon. In addition to its powerful and efficient performance, TEL A303I-KVCKN features a number of features that ensure optimal process control and safety. It is equipped with a 5-axis movable manipulator for accurate wafer movement, as well as highly precise temperature control. Additionally, TOKYO ELECTRON A303I-KVCKN is designed with superior radiation shielding, preventing material leakage and protecting against radiation exposure. A303I-KVCKN is an ideal diffusion furnace and accessorie for production process of high-quality integrated circuit components. It offers high performance, precision, and safety to ensure optimal process control.
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