Used TEL / TOKYO ELECTRON A303i #9271013 for sale

TEL / TOKYO ELECTRON A303i
ID: 9271013
Wafer Size: 12"
Vintage: 2006
Vertical diffusion furnaces, 12" Process: DIFF 2006 vintage.
TEL / TOKYO ELECTRON A303i is a powerful diffusion furnace specifically designed for semiconductor research and fabrication. This tool facilitates the diffusion of dopants into a substrate material, allowing for the creation of complex semiconductor devices. TEL A303i features five vertical zones and one common upper zone. All five zones are independently controlled in both temperature and atmosphere. TOKYO ELECTRON A 303 I is capable of temperatures up to 1400°C in both oxidizing and reducing atmospheres, as well as inert gas environments. Additionally, the chamber can operate in high-purity hydrogen gas and chlorine-based atmospheres. A303i is equipped with the latest PAM-2000 control systems, an advanced array of sensors, and instrumentation for monitoring and maintaining optimal wafer processing conditions. It also provides a user-controllable lid. This flexible lid enables users to adjust the number of openings or enter wafers through the glass door. The powerful TOKYO ELECTRON A303i also features adjustable platen spacing, a large silicon-carbide bottom and top platen, stylish cassette carriers, an automated wafer transfer port, a stepper motor drive system, and more. TEL / TOKYO ELECTRON A 303 I diffusion furnace provides maximum process control and flexibility to users seeking precision semiconductor device production. With its innovative features and advanced technology, A 303 I is an excellent choice for a wide range of semiconductor applications.
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