Used TEL / TOKYO ELECTRON A303i #9314615 for sale

TEL / TOKYO ELECTRON A303i diffusion furnace and accessories are designed to process semiconductor wafers with high efficiency and power. The equipment comprises of a furnace chamber, resistive heating elements, a source of inert, non-reactive gas, a cooling fan, and a power supply. The furnace chamber is designed to house the low-pressure process environment and is made out of ceramic and metal. It features programmable temperature ranges from 30℃ to 1,200℃, enabling adjustable process flow rates and accurate control of temperature. The heating elements consist of iron-chromium alloy wire, which provides uniform heat transfer and insulation of the process chamber. The inert gas, typically nitrogen or Helium, is delivered through the chamber walls to ensure uniform heat distribution and clean environment. The cooling fan is used to maintain the chamber temperature by drawing out the heat generated from the resistive heating elements. Lastly, a dedicated power supply is required to provide an optimal flow of electricity to the system. TEL A303i diffusion furnace is designed for quality control, semiconductor preparation, and wafer doping applications. It has a small footprint and is easy to operate. Furthermore, its features enable customizable and programmable process flows which helps to produce high-quality results. The precision of the temperature control equips the unit with the ability to adjust the process flow rate for specific applications. In addition to the diffusion furnace, accessories are available for purchase to further customize the machine. These accessories can connect external devices, such as mass flow controllers, pyrometers, additional sensors, and monitoring software. The software can track the process parameters achieved during the chamber cycle and the data collected is used to generate a comprehensive report. Overall, TOKYO ELECTRON A 303 I diffusion furnace and accessories are designed to be reliable and efficient. It is a cost-effective option for semiconductor preparation and wafer doping processes, providing users with a customizable process flow and quality control features.