Used TEL / TOKYO ELECTRON A303i #9315050 for sale

TEL / TOKYO ELECTRON A303i
ID: 9315050
Wafer Size: 12"
Vintage: 2006
Vertical diffusion furnace, 12" 2006 vintage.
TEL / TOKYO ELECTRON A303i is a high-performance diffusion furnace and associated accessories for wafer processing. It is a reliable, easy to use and long-lasting tool for semiconductor production environments. TEL A303i is a high-temperature, multi-zone furnace used for thermal process control. It offers precise and repeatable thermal processing conditions for a variety of substrates and materials. TOKYO ELECTRON A 303 I has a maximum temperature of 1200°C and can range from up to 20°C to 1200°C. It also features a uniformity of ±2 °C and a stability of ±0.1 °C. It utilizes advanced advanced control systems which are specifically designed for temperature mapping of wafers in the short duration of time. A 303 I is able to provide dynamic information about the temperature of the wafers, which in turn can be used to prevent wafer warpage or contour non-uniformities from thermal processing. TOKYO ELECTRON A303i also features a graphite susceptor liner for improved heat dissipation and better temperature monitoring. The susceptor liner also helps maintain a clean processing environment during wafer production. In addition to the high-quality thermal processing, TEL / TOKYO ELECTRON A 303 I also presents users with a variety of process gas control systems. It is capable of achieving a wide range of process gas mixing ratios, from 50/50 to 99/1 of several gases and allowing significant flexibility to optimize wafer quality. It also offers precise process control through the online gas flow meter. A303i is available with multiple process parameters such as heating rate, temperature profile, process recipes, and more, which can be programmed to meet individual process requirements and improve device performance. It incorporates a variety of safety options, including temperature sensors and overcurrent protection measures. All of this makes TEL A 303 I an efficient, accurate, and safe system for thermal processing. With its advanced technologies and top features, it provides unparalleled performance for wafer production.
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