Used TEL / TOKYO ELECTRON A303i #9351450 for sale
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ID: 9351450
Wafer Size: 12"
Vintage: 2003
Vertical diffusion furnaces, 12"
2003 vintage.
TEL / TOKYO ELECTRON A303i is a revolutionary diffusion furnace and accessories package from TEL that can be used for a wide range of applications. This package contains a high-tech diffusion furnace with an integrated TEL A303i controller for precise control over temperature and growth conditions, as well as an array of accessories that are necessary for operation. TOKYO ELECTRON A 303 I features a maximum processing temperature of 1050°C, which is ideal for some of the most technologically advanced materials, such as semiconductor devices and dielectric films. A303i diffusion furnace has several benefits such as cost savings, high temperature control, and precise repeatability. The cost savings associated with TOKYO ELECTRON A303i diffusion furnace can be attributed to its remarkably efficient heating elements, which use either up to 30 kW of power or a combination of electricity and flowing process gases. The power distribution for A 303 I diffusion furnace is completely customizable and can be adjusted for different sizes of wafers. By using TEL / TOKYO ELECTRON A 303 I, a user can ensure that their wafers are heated uniformly, regardless of their size or shape. Additionally, TEL A 303 I diffusion furnace provides highly precise temperature control, meaning all users can achieve the desired crystal growth without having to worry about damaging the sample. In terms of repeatability, TEL / TOKYO ELECTRON A303i features a repeatability accuracy of less than ±0.2°C, ensuring that the repeatability of your experiment remains exact, which is essential for achieving reproducible results. Additionally, the patented gas-in-lining system greatly reduces safety risk during operation, by providing an even flow of gases, ensuring that no catastrophic incidents occur during the diffusion process. TEL A303i package also includes several accessories necessary for operation. These accessories include a vacuum pump with 10 l/min rotatory speed for fast wafer evacuation, a high capacity gas mixing valve, two dedicated ports with high-flow valves for gas exhaust, and an optional gas in-line valve for higher accuracy gas flow rates. Furthermore, each system comes with easy-to-read manuals, and some even include a training tool so users can become familiar with TOKYO ELECTRON A 303 I. A303i diffusion furnace and accessories package is ideal for those seeking a versatile and reliable system for exact crystal growth and other diffusion processes. By utilising the efficient heating elements, precise temperature control, repeatability and a comprehensive range of safety components, TOKYO ELECTRON A303i is the ideal solution for a wide range of applications.
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