Used TEL / TOKYO ELECTRON A303i #9351462 for sale

TEL / TOKYO ELECTRON A303i is a diffusion furnace and associated accessories used in semiconductor fabrication processes for wafer baking and rapid thermal processing. It is capable of processing up to 200mm wafers per run, with process temperatures up to 1200°C. The user can choose from three types of heating sources, depending on the application: resistance heating, alternating current (AC) heating, or direct-current (DC). The furnace has a wide range of temperature and flow control parameters that can be configured to meet process requirements, including gas flow, pressure, and wafer temperature. The furnace is also compatible with a variety of gas delivery systems, including integrated in-situ mass spectroscopy. In order to ensure wafer uniformity, TEL A303i is equipped with an advanced PID temperature control equipment for precise temperature control. This advanced system utilizes advanced algorithms to quickly and accurately adjust temperatures and process parameters, ensuring uniformity across the wafer during each run. In addition to its temperature control unit, TOKYO ELECTRON A 303 I also uses a variety of gas delivery systems to achieve accurate film deposition. A gas panel allows for in-situ monitoring and precise flow control, while the integrated mass spectrometer allows for rapid gas composition/concentration mapping of the process atmosphere. In-situ sampling is also available for process control purposes. TOKYO ELECTRON A303i provides a high level of safety during operation, with two safety interlocks that cut off the power to the furnace when the lid is opened. Safety shielding is also available as an added precaution, as well as an audible alarm that informs the user when a limit is exceeded. The furnace also includes a number of visual and audible feedback systems, including a display monitor for analyzing temperatures and process parameters in graph form, and two modules for controlling, recording, and monitoring process data and parameters in real-time. TEL / TOKYO ELECTRON A 303 I is designed for easy integration into existing production systems, as well as providing users with an intuitive user interface. Its advanced software allows for user customization of many of the furnace's systems, allowing for easy and efficient operation. The furnace also features an optional alarm machine, which can be activated when a particular process parameter is exceeded. Overall, A 303 I is a reliable and efficient diffusion furnace with an array of features to meet the needs of semiconductor fabrication applications. Its advanced temperature control tool and range of gas delivery systems provide precise and consistent results, ensuring uniformity across the wafer. With its intuitive user interface and integrated safety systems, A303i can be a valuable tool for the semiconductor industry.