Used TEL / TOKYO ELECTRON A303i #9400223 for sale

TEL / TOKYO ELECTRON A303i
ID: 9400223
Wafer Size: 12"
Vertical diffusion furnace, 12" Process: MTO.
TEL / TOKYO ELECTRON A303i is a state-of-the-art diffusion furnace designed for superior temperature uniformity and enhanced process control. It provides critical temperature ramps, accurate thermal processing and improved efficiency. It is also equipped with advanced internal components like a high power RF amplifier and innovative diffuser technology that make it suitable for batch and cluster tool production processes. TEL A303i features a multi-zone configuration with a large heating chamber and two removable heating zones. It achieves excellent uniformity in different parts of the chamber. The heating chamber can reach temperatures up to 1400°C, making it suitable for various semiconductor fabrication processes including annealing, drying, drive-in, oxidation, and nitridation. The chamber also features edge insulation as well as powerful side-applied heating to ensure high levels of process repeatability. TOKYO ELECTRON A 303 I also has enhanced RF power delivery and control for improved wafer-to-wafer uniformity. It utilizes advanced RF matching technology to deliver the right power bundles, avoiding RF-induced interference on adjacent wafers. This revolutionary control equipment also allows for precise temperature trimming and independent zone heating. A 303 I also comes with a wide range of advanced accessories, such as an inert atmosphere flow system, an inert gas unit, a glove box and an LPCVD machine. The inert atmosphere tool ensures stable chemical processing at temperatures up to 1300°C. The inert gas asset provides an inert atmosphere to minimize the introduction of impurities on the wafers. The glove box isolates the chamber from ambient air, increasing temperature uniformity and preventing oxidation. Finally, the LPCVD model provides a more economical and efficient alternative to PECVD. TOKYO ELECTRON A303i is a feature-rich diffusion furnace that produces superior results with excellent repeatability and overall performance. Its advanced internal components and versatile accessories provide the perfect solution for semiconductor manufacturing applications.
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