Used TEL / TOKYO ELECTRON Alpha 303C #293643329 for sale
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TEL / TOKYO ELECTRON Alpha 303C is a diffusion furnace and accessory used in semiconductor device fabrication and other technology applications. TEL Alpha 303C is a highly reliable and powerful three-zone furnace that can provide high speed, precision processing of substrates up to eight inches in diameter. It supports a wide range of diffusion process gases, temperatures up to 1000 degree Celsius, and can accommodate up to four substrates simultaneously. TOKYO ELECTRON Alpha 303C features several advanced technologies, such as a deep cooling zone optimized for temperature homogeneity, a narrower temperature range for improved uniformity, and a dual-zone zone for high-temperature range operations. The dual-zone zone also offers improved cold water performance by allowing the water to be supplied from both sides of the furnace. TEL has designed Alpha 303C to provide very fast transient response times. In addition, its advanced PID control system allows for independent heating regulation, so each substrate experiences the exact same process conditions. Its controller also offers multiple-level setpoint temperature protection and temperature distribution control, which reduces temperature variation across the substrates. Furthermore, TEL / TOKYO ELECTRON Alpha 303C uses an advanced mass flow controller to ensure an optimal supply of process gases. This enables the process to be carried out at much quicker speeds with exceptional repeatability and high quality results. TEL Alpha 303C is also equipped with a built-in auto-tuning feature, which allows the operator to adjust the setpoint temperature, the power distribution ratio between upper and lower zones, and other parameters to account for changing process conditions in applications where tight temperature control is essential. Overall, TOKYO ELECTRON Alpha 303C is a powerful, reliable and highly accurate diffusion furnace and accessory that is well-suited for a variety of shematic device fabrication and technology applications. It offers excellent precision and repeatability of the diffusion process, and its user-friendly setup and advanced features make it an excellent value for users in the industry.
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