Used TEL / TOKYO ELECTRON Alpha 303i-H #9097225 for sale

TEL / TOKYO ELECTRON Alpha 303i-H is a diffusion furnace and accessory equipment used for advanced semiconductor device fabrication. This state-of-the-art system includes a horizontal furnace equipped with a high temperature multi-zone heating chamber and a single chamber load-lock unit. It is designed to process silicon, silicon-on-insulator (SOI) and silicon-germanium (SiGe) wafers up to 300 mm in diameter. The machine features an advanced controller with an easy-to-use touchscreen interface that provides growers with automated control of the base temperature, heating rate, cooling rate, gas flow and pressure levels. A high tech alarm tool is also included to warn users in the event of a malfunction or unexpected conditions. The furnace uses a linear inductive heating asset, which employs an array of coils to generate a uniform temperature profile across the surface of the wafer, ensuring precise temperature distribution at every point. The heating and cooling parameters can be adjusted to very low and very high levels, allowing processes such as annealing and oxidizing to be performed with very high levels of accuracy and control. Inside the furnace, a multi-zone heating model is used to address temperature nonuniformity, with up to seven independent temperature zone configurations capable of being created. The furnace is also outfitted with low thermal radiation and active thermal management modules, ensuring efficient thermal performance. The process is further enhanced with an intelligent humidifier that reduces condensation and prevents contamination. Finally, TEL Alpha 303i-H comes with a single chamber load-lock equipment that minimizes wafer-to-wafer contamination, and with a complex gaseous environment monitoring system which allows users to precisely measure concentrations of different gasses, ensuring optimal performance of the diffusion process. Overall, TOKYO ELECTRON Alpha 303i-H is a state-of-the-art diffusion furnace and accessory unit that provides users with the accuracy, precision and control they need for higher yield semiconductor device fabrication processes.