Used TEL / TOKYO ELECTRON Alpha 303i-H #9097233 for sale

TEL / TOKYO ELECTRON Alpha 303i-H is a diffusion furnace and accessories equipment specifically designed for the processing of compound semiconductor substrates. It features a wide array of safety, automation, and convenience features which make it a desirable option for laboratories and production plants that require a reliable and efficient tool for high-volume production runs of semiconductor components. TEL Alpha 303i-H diffusion furnace is built with precision in mind and can achieve temperatures of up to 1,900°C. It also includes an advanced heating control system and capable of ramp rate control which allows the user to achieve tight process control and repeatability for uniform results. The process chamber is sealed with a ceramic window and provide pressurized inert or reactive gas flows to the wafer, believed to offer superior dopant uniformity and yields and an optimized crystal growth environment. The internal loading unit helps automate the loading and unloading of substrates in the process chamber in a rapid sequential pattern and allows for concurrent process runs of up to three substrates within the same load lock cycle. It also includes other advanced loading features such as a force compensation machine that applies uniform pressure here the chuck and chuck ring which helps ensure contact between the substrates and the chuck, leading to uniform heat transfer and optimized process stability. TOKYO ELECTRON Alpha 303i-H tool is also designed with user safety and convenience in mind. It includes an advanced cooling water asset, with the process and cooling loops in separate chambers, to eliminate the potential for cross contamination between the process and cooling loops. The model is also equipped with a number of safety features including an inert pressure control equipment, an emergency stop button, and a leak detection system. In addition to the main diffusion furnace, Alpha 303i-H unit also includes a number of accessories for optimizing your process runs. These include an Oxidation/Diffusion Machine designed for oxidation and thermal oxidation processes; a GASDIFF Pre-Diffusion Tool for pre-diffusion processes; and an Etching Asset to facilitate wet and dry etching. The model also includes a GASDIFF PC Interface for software integration and an LCD Touchpanel Control Unit for easy and intuitive operation. In conclusion, TEL / TOKYO ELECTRON Alpha 303i-H equipment is an advanced and reliable diffusion furnace system that is designed to maximize user flexibility, safety, and process stability. It offers a wide array of features and accessories for efficient, repeatable, and high-quality production of compound semiconductor substrates.