Used TEL / TOKYO ELECTRON Alpha 303i-H #9097235 for sale

TEL / TOKYO ELECTRON Alpha 303i-H diffusion furnace and accessories is an advanced set of tools and equipment designed to meet the toughest requirements of the semiconductor industry. The furnace consists of a stainless steel chamber with a maximum operating temperature of 1250°C and a chamber ceiling temperature of 1100°C. It is engineered with a double walled construction and is fitted with an interchangeable liner for easy maintenance and superior results. The automated control equipment along with the advanced process control technology offer superior temperature uniformity and rapid cycle times. The device also comes with high-precision gas control, load lock wafer cassettes, and TEL Lam Molecular Beam Embedder to provide even better process control. This powerful combination of components ensures a highly advanced solution for today's semiconductor device development. TEL Alpha 303i-H furnace comes with advanced diagnostics and safety functions that enable it to communicate with the user and provide detailed information about system operations. This also helps with troubleshooting and maintenance, and offers users a greater level of control. The user-friendly graphical interface provides easy access to unit parameters and helps to ensure correct machine operation. The diffusion furnace also includes a quartz tube heater, an automatable temperature/pressure control, tungsten resistive heating elements, an exhausting tool, and high-performance twin-zone gas mass flow controllers. These additional components provide a complete package for a successful and efficient thermally managed process. TOKYO ELECTRON Alpha 303i-H asset offers a wide range of materials processing capabilities, including the ability to process substrates for both CU-BO surface finishing and nitride process. The diffusion furnace can be fitted with multiple high density/low drift motors that offer high accuracy and repeatability with variable speed control and real-time monitoring capabilities. Alpha 303i-H model also includes a built-in gas box that creates a sealed atmosphere for an even diffusion of gas molecules on the target substrate. This ensures an accurate, repeatable, and low-tolerance diffusion of gases on the substrate. TEL / TOKYO ELECTRON Alpha 303i-H equipment is a smart solution for today's complex semiconductor device production processes. Its advanced design, feature set and ease of use combine to offer users the best possible solution for any modern semiconductor device production environment.