Used TEL / TOKYO ELECTRON Alpha 303i-H #9097239 for sale

TEL / TOKYO ELECTRON Alpha 303i-H
ID: 9097239
Wafer Size: 12"
Vintage: 2002
MTO Furnace, 12", 2002 vintage.
TEL / TOKYO ELECTRON Alpha 303i-H is one of the most advanced semiconductor wafer processing diffusion furnaces on the market. This four-substrate furnace equipment integrates innovative, advanced designs and customizable settings to provide high-quality wafering and superior wafer uniformity. TEL Alpha 303i-H is equipped with multiple load ports and Obsidian logic control to automatically monitor and adjust core furnace temperatures in both the load and unload zones. Additionally, the unique design of TOKYO ELECTRON Alpha 303i-H enables extended heater lifetime, increased vapor and gas purity, improved wafer uniformity, precise temperature control, and fast, efficient loading and unloading of substrates. Alpha 303i-H is designed with a unique, integrated gas management system which maximizes purity and gas usage efficiency. It features advanced valves and vents to reduce exhaust loss, expandable purge times, adjustable flow and pressure settings, and a closed chamber unit for increased thermal uniformity. This machine also includes a vacuum switch, data port, and active water jet pump to ensure reduced temperature fluctuations, higher purity and uniformity, and consistent vapor exposure in the temperature uniformity chamber. TEL / TOKYO ELECTRON Alpha 303i-H is equipped with TEL PowerWaferII advanced wafer transport tool, which ensures high-precision loading and unloading of substrates. This asset allows for individual operations in each port and is designed to minimize wafer falloff and particle contamination. The PowerWaferII includes an automated contamination control (ACC) model and sealed gasketed sub-ports to minimize layer contamination and ensure maximum wafer stability. TEL Alpha 303i-H also runs on TOKYO ELECTRON proprietary, user-friendly MGC-25 Platform, which highlights its flexible programming capabilities. This platform allows for customizable settings, pre-programmed functions, and automated operations, allowing users to rapidly configure, change, and monitor diffusion processes. Overall, TOKYO ELECTRON Alpha 303i-H diffusion furnace provides an advanced modular design, optimized gas management equipment, proprietary PowerWaferII wafer transport system, and user-friendly MGC-25 Platform to achieve superior wafer uniformity and long-lasting performance. Alpha 303i-H is a dependable and reliable diffusion furnace for a variety of semiconductor wafer processing applications.
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