Used TEL / TOKYO ELECTRON Alpha 303i-H #9394974 for sale

TEL / TOKYO ELECTRON Alpha 303i-H
ID: 9394974
Wafer Size: 12"
Furnace, 12" MTO.
TEL / TOKYO ELECTRON Alpha 303i-H is a diffusion furnace and accessorie designed for advanced processing applications in semiconductor and MEMS (Micro-Electro-Mechanical Systems) fabrication. The equipment features an ultra-high temperature side-wall gas inlet/outlet with a 600°C limit as well as a low-cost, reliable, and energy efficient option for gas distribution for rapid heating and cooling rates. The furnace is equipped with an advanced multi-zone, multi-atmosphere, active temperature monitoring/control system. TEL Alpha 303i-H has a maximum substrate size of 40mm2 and offers excellent thermal homogeneity and uniformity, with a 0.2°C fluctuation across in the range of -20 to 1200°C. This ensures minimization of thermal stress and uniformity across the entire temperature range with minimal thermal gradient across the substrate. The unit also has a low top surface temperature of up to 300°C, and power saving features such as a selective long-wavelength optical leak-detection machine to prevent unnecessary losses of rare and expensive process gas. TOKYO ELECTRON Alpha 303i-H also has an advanced active temperature monitoring/control tool with independent programming times and multi-zone controller, with one-temperature up to eight-zone control conditions. It also includes a large computer with a variety of advanced features such as customer history log, user setup mode, event log, chamber monitoring, custom set-point control, process data collection and list-file capability, and multi-tasking data collection. It also offers an alarm asset warning for any temperature fluctuations and/or process problems, which allows users to address any unexpected events in the process. The model also features advanced safety features such as low gas pressure shut-off, radiation detection, gas leakage detection, emergency shut-off and exhaust gas control systems. It also has an advanced cooling equipment to protect against temperature overshoot when rapid cooling occurs, as well as a programmable cooling after process completion to properly cool the chamber and to save energy. Overall, Alpha 303i-H is an efficient and reliable diffusion furnace and accessorie designed for advanced processing applications in semiconductor and MEMS fabrication, with a number of features designed for both safety and accuracy.
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