Used TEL / TOKYO ELECTRON Alpha 303i-H #9411632 for sale
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ID: 9411632
Wafer Size: 12"
Vintage: 2001
Furnace, 12"
Process: MTO
Exhaust box
AC Rack
Heater
2001 vintage.
TEL / TOKYO ELECTRON Alpha 303i-H is a diffusion furnace and accessory equipment designed for semiconductor fabrication. It offers an efficient, reliable, and affordable way to create small devices with large yields and high reliability. The system consists of a chamber with special heat and vacuum conditions, a wafer holder, and a gate controller. The gate controller provides control of the temperature, gas flow, and pressure inside the chamber. TEL Alpha 303i-H utilizes a 3-in 1-process gas solution combined with a newly developed gas distribution unit. This combination allows for rapid and stable high flux deposition needed for modern device performance. The heated chamber also has a unique "playback mode" that allows users to replay simulations of past recipes. This allows for fine-tuning as well as reproducibility of process recipes. The wafer holder uses cutting edge CVD technology, featuring an embedded serration design, eliminating the need for wet cleaning. The high-precision flatness of the substrate surface after loading ensures even and uniform distribution of the substrate during the diffusion process. The control machine also has advanced PLC logic and a color display that monitors process data. TOKYO ELECTRON Alpha 303i-H diffusion furnace is designed for excellent temperature stability and uniformity as well as fast cooling and heating rates. The tool is equipped with two gas inlets and a vacuum out feature for a safe and controlled process. The connection of the power supply, the controller, and the asset cascades enable direct access to process control, saving time and effort. All the control and safety features are TEL approved with advanced HMI functions. Alpha 303i-H diffusion furnace is an ideal solution for the fabrication of high-quality, reliable, cost-effective semiconductors. With a wide temperature range, advanced process control, and automatic operation, the model gives users a worry-free and easy to use device. From high-volume mass production to low-volume prototype production, it can meet the demands of all fabrication processes. Moreover, it is designed to enhance productivity, efficiency, and performance.
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