Used TEL / TOKYO ELECTRON Alpha 303i-K #293606620 for sale

ID: 293606620
Vintage: 2005
LPCVD Furnace 2005 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K is a high-performance diffusion furnace and accessories designed for use in semiconductor fabrication processes. It is capable of up to 250 fph maximum diffusion and is equipped with advanced temperature controllers and uniformity controls for precise temperature and process control. The furnace utilizes a radical source diffusion method, combining a low co-temperature and cost-effective process with a short wafer processing time. TEL ALPHA 303IK features a large chamber size of 250 x 600mm, with a large automatic gas box and a pneumatic liftable cassette loader. A premium forced hot air cooling system provides highly efficient cooling without recirculation of heat and avoids contamination by hot gas. The controller offers repeatable and stable high-temperature control. A built-in process-trace system with recipe management capability stores and manages up to 1000 process data items. TOKYO ELECTRON ALPHA 303 I K is designed to improve production yields and is suitable for mass production needs. It is reliable and comes with a maintenance-free design, eliminating frequent maintenance procedures. The furnace is highly efficient and can run up to 250 fph, significantly reducing the cycle time for industrial production processes. The gas box and Wafer Size Estimator (WSE) sensor provide precise gas flow control, reducing gas consumption. In addition, the built-in self-diagnostic functions guarantee consistent process results. TEL ALPHA 303 I K is designed to offer maximum flexibility in device production and makes process changes easy via the intuitive 7-inch color LCD touch panel. The multiple layer SSH (Secure Shell) network/memory system stores and manages up to 500 recipes, and also allows remote process monitoring and data retention for future inspection. TOKYO ELECTRON Alpha 303i-K is an easy-to-install and low-maintenance diffusion furnace and accessories. It is an ideal choice for semiconductor fabrication processes, providing accuracy, repeatability, and reliable performance at a reasonable price.
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