Used TEL / TOKYO ELECTRON Alpha 303i-K #293606624 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessory for research and development applications. It is a thermally stable platform for advanced semiconductor processing. The furnace has a working pressure of 300 Torr and a maximum operation temperature of 2000°C. It is equipped with advanced safety features, such as a BN55 magnetically enhanced quartz window, a hydrogen/argon thermal cut-off valve, and an infrared thermography system for temperature detection. TEL ALPHA 303IK offers a standard wafer size of 6 inch and a maximum wafer thickness of 2000 µm. It has a quartz hot zone with an alumina liner and is able to accommodate up to three pieces of quartz inside the chamber. The system allows for backside heating of the wafer via a dielectric heater plate and features a two-channel µW stage controller. The furnace is capable of controlling up to 24 quartz. It is also equipped with advanced temperature measurement and control capabilities. TOKYO ELECTRON ALPHA 303 I K has a standard processing time of 10 minutes to heat up to a given temperature. The furnace can accept wafers of varying sizes and shapes, allowing for process optimization. It also includes a high-efficiency ICV valve, an air-cooling system, and heating detector. ALPHA 303 I K is suitable for low-temperature processes, such as oxide dielectric growth and contact formation. It is also ideal for high-temperature processes, such as annealing and metallization. It has the capability to be operated in a fully-automated mode and the ability to upload customized recipes through the company's TEL programming language. ALPHA 303IK is a reliable and versatile tool for advanced semiconductor processing applications. Its built-in safety features ensure safe operation and its low-maintenance design provides higher yields and lower operating costs. Its advanced temperature control and measurement capabilities make it an ideal choice for any research and development laboratory.