Used TEL / TOKYO ELECTRON Alpha 303i-K #293618667 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is an advanced diffusion furnace that combines high process performance with a full suite of accessories. The furnace is equipped with several advanced features that allow it to precisely control temperature and process parameters. This system is ideal for advanced semiconductor processing applications such as epitaxy, CVD, and ALD. The furnace is equipped with two process sources and two independent temperature control zones. It is also capable of operating in a diffusion, batch, or single wafer mode. The two sources are capable of delivering temperatures from 300°C to 1200°C making it suitable for a variety of semiconductor processing tasks. The integrated heating chamber also has high temperature and uniformity precision. Additional features such as gas mixing fine-tuning, pressure and temperature safety monitoring, and automatic gas shutoff capabilities further increase the safety of the system. TEL ALPHA 303IK also comes with a number of accessories such as an ion mill, a load lock, and a robust automation package. The ion mill can be used to precisely etch the wafer. The load lock ensures rapid process startup and enables efficient use of process gases. The automation package simplifies the operation of the furnace, allowing users to program and schedule recipes with ease. In conclusion, TOKYO ELECTRON ALPHA 303 I K is an advanced diffusion furnace that combines high process performance, precision, and safety with a robust set of accessories. It is ideal for advanced semiconductor processing tasks such as epitaxy, CVD, and ALD. Additionally, the ion mill, load lock, and automation package make the system even more user-friendly by providing process consistency and efficiencies.